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首页> 外文期刊>Thin Solid Films >Experimental study by Secondary Ion Mass Spectrometry focused on the relationship between hardness and sputtering rate in hard coatings
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Experimental study by Secondary Ion Mass Spectrometry focused on the relationship between hardness and sputtering rate in hard coatings

机译：二次离子质谱法的实验研究侧重于硬涂层中硬度与溅射速率之间的关系

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摘要

Hardness is a key property in materials' characterization, particularly regarding micro and submicron functional coating technology. Hardness definition is commonly cited as the resistance of materials to plastic deformation. To assess the hardness value of a given material different methods are available and can be defined as macro-, micro- or nano-scale according to the forces applied and the displacements obtained. Nano-hardness measurements are essential for functional thin coatings characterization. In the present work we tested the possibility to evaluate coatings hardness by using a complementary method: the ion beam sputtering by Secondary Ion Mass Spectrometry (SIMS) equipment. This approach has two evident advantages: independence of measurements from the substrate and additional compositional and structural information provided by SIMS measurements.
机译：硬度是材料表征的关键属性，特别是在微米和亚微米功能涂层技术方面。硬度定义通常被称为材料对塑性变形的抵抗力。为了评估给定材料的硬度值，可以使用不同的方法，并且可以根据施加的力和获得的位移将其定义为宏观，微米或纳米尺度。纳米硬度测量对于功能性薄涂层表征至关重要。在本工作中，我们测试了使用补充方法评估涂层硬度的可能性：通过二次离子质谱（SIMS）设备进行离子束溅射。该方法具有两个明显的优点：测量与衬底的独立性以及SIMS测量提供的其他成分和结构信息。

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  • 来源
    《Thin Solid Films》 |2017年第1期|35-41|共7页
  • 作者

    Onorati E.; Iacob E.; Bartali R.; Barozzi M.; Gennaro S.; Bersani M.;

  • 作者单位

    Fondazione Bruno Kessler, Ctr Mat & Microsyst, Via Sommarive 18, I-38122 Trento, Italy|Univ Trento, Dept Ind Engn, Via Sommarive 9, I-38122 Trento, Italy;

    Fondazione Bruno Kessler, Ctr Mat & Microsyst, Via Sommarive 18, I-38122 Trento, Italy;

    Fondazione Bruno Kessler, Ctr Mat & Microsyst, Via Sommarive 18, I-38122 Trento, Italy;

    Fondazione Bruno Kessler, Ctr Mat & Microsyst, Via Sommarive 18, I-38122 Trento, Italy;

    Duralar Technol Japan, 147-40 Masuragaham, Nagasaki 8560022, Japan;

    Fondazione Bruno Kessler, Ctr Mat & Microsyst, Via Sommarive 18, I-38122 Trento, Italy;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Sputtering rate; Secondary ion mass spectrocopy; Nanoindentation; Diamond-like carbon; Atomic force microscopy;

    机译：溅射速率;二次离子质谱;纳米压痕;类金刚石碳;原子力显微镜;

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