Chemical vapor deposition of phase-rich WC thin films on silicon and carbon substrates

著录项

• 来源
  《Thin Solid Films》 |2008年第12期|3847-3854|共5页
• 作者

  Kendra A. Beadle; Rahul Gupta; Anoop Mathew; Jingguang G. Chen; Brian G. Willis;

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• 作者单位

  Department of Chemical Engineering, Center for Catalytic Science and Technology (CCST), University of Delaware, Newark, DE 19716, USA;

  Department of Chemical Engineering, Center for Catalytic Science and Technology (CCST), University of Delaware, Newark, DE 19716, USA;

  Department of Materials Science and Engineering, University of Delaware, Newark, DE 19716, USA;

  Department of Chemical Engineering, Center for Catalytic Science and Technology (CCST), University of Delaware, Newark, DE 19716, USA;

  Department of Chemical Engineering, Center for Catalytic Science and Technology (CCST), University of Delaware, Newark, DE 19716, USA;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  CVD; tungsten carbide (WC) films; XRD; XPS; electrocatalysts;

  机译：CVD;碳化钨（WC）膜;XRD;XPS;电催化剂;