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首页> 外文期刊>Thin Solid Films >Coatings and microstructures of monolithic TiB_2 films and double layer and composite TiCN/TiB_2 films from alkoxide solutions by thermal plasma CVD
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Coatings and microstructures of monolithic TiB_2 films and double layer and composite TiCN/TiB_2 films from alkoxide solutions by thermal plasma CVD

机译：热等离子体CVD从醇盐溶液中制备单片TiB_2薄膜和双层及复合TiCN / TiB_2薄膜的涂层和微观结构

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摘要

Monolithic TiB_2 films and double layer and composite TiCN-TiB_2 films were deposited on Si wafers from a mixture of titanium tetra-ethoxide and boron tri-ethoxide solutions at a 1:2 mole ratio at 800 ℃ for 20 min by chemical vapor deposition in a thermal N2/H_2 plasma. The TiB_2 films were deposited without N_2, while the double layer and composite TiCN-TiB_2 films of various compositions were deposited by varying N_2 flow rates in N_2/H_2 plasma. The surfaces and cross-sections of the films were observed by SEM, exhibiting the microstructures and thickness of the films. The relative atomic percentages of Ti, N, B, bonded and free C, and O in the films were determined semi-quantitatively from their XPS peak areas. Microstructures of the composite films with the composition 3TiC_(0.5)N_(0.5)/2TiB_2 formed at N_2=50 mL min~(-1) were observed by TEM, revealing the sizes and orientations of the particles with the distribution of Ti and B elements in the film.
机译：在800℃下以1：2的摩尔比从四乙氧基钛与三乙硼硼的混合溶液中通过化学气相沉积法在Si晶片上沉积整体TiB_2薄膜和双层TiCN-TiB_2复合薄膜。 N2 / H_2热等离子体。在没有N_2的情况下沉积了TiB_2膜，而通过改变N_2 / H_2等离子体中的N_2流速沉积了各种组成的双层和复合TiCN-TiB_2膜。通过SEM观察膜的表面和横截面，显示出膜的微观结构和厚度。薄膜中Ti，N，B，键合和游离C和O的相对原子百分比是从XPS峰面积半定量确定的。透射电镜观察了N_2 = 50 mL min〜（-1）形成的3TiC_（0.5）N_（0.5）N_（0.5）/ 2TiB_2组成的复合膜的微观结构，揭示了Ti和B分布的颗粒尺寸和取向电影中的元素。

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