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Comparative studies of the feed gas composition effects on the characteristics of DLC films deposited by magnetron sputtering

机译：进料气组成对磁控溅射沉积DLC薄膜特性影响的比较研究

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Mixtures of acetylene/argon and methane/argon with different volume percents of hydrocarbon were used as the precursor gas to grow DLC films, keeping constant the other process parameters. The substrates used were p-type (100) silicon wafers. The films were characterized by Raman spectroscopy, nanoindentation, atomic force microscopy (AFM) and by a profilometer. In order to grow DLC films with special properties that could make this material an alternative candidate for applications in micro-electromechanical systems (MEMS) production, a comparative analysis focused on the influence of the hydrocarbon precursor gas mixture on the mechanical and chemical properties of the DLC films is reported.
机译：将乙炔/氩气和甲烷/氩气与不同体积百分比的烃的混合物用作生长DLC膜的前驱气体，同时保持其他工艺参数不变。所使用的衬底是p型（100）硅晶片。通过拉曼光谱，纳米压痕，原子力显微镜（AFM）和轮廓仪对薄膜进行表征。为了生长具有特殊性能的DLC膜，可以使这种材料成为微机电系统（MEMS）生产中应用的替代选择，比较分析的重点是烃前体气体混合物对碳纳米管机械和化学性能的影响。报道了DLC膜。

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