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首页> 外文会议>18th Symposium on Microelectronics Technology and Devices; 16th Symposium on Integrated Circuits and System Design; Sep 8-11, 2003; Sao Paulo, Brazil >Effects of C_2H_2 gas content on the characteristics of DLC films deposited by magnetron sputtering
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Effects of C_2H_2 gas content on the characteristics of DLC films deposited by magnetron sputtering

机译：C_2H_2气体含量对磁控溅射沉积DLC薄膜特性的影响

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摘要

Diamond-like carbon (DLC) films were deposited on a p-type(100) silicon wafer by reactive d.c. magnetron sputtering technique using a 99,999% pure graphite target. A mixture of acetylene (C_2H_2) and argon (Ar) at different volume percent was used as the precursor gas to produce the films, keeping constant the other process parameters. The effect of the hydrocarbon content on the properties of the films were studied. The hardness of these films were determined by nanoindentation and the results indicate an optimum value of acetylene content in the discharge which maximize the hardness. Analysis by Raman spectroscopy, goniometer and profilometer measurements were also made to determine the correlation between films growth parameters and their structural and tribological properties.
机译：类金刚石碳（DLC）膜通过反应性直流电沉积在p型（100）硅晶片上。使用99,999％纯石墨靶材的磁控溅射技术。以不同体积百分比的乙炔（C_2H_2）和氩气（Ar）的混合物用作制备薄膜的前驱气体，同时保持其他工艺参数不变。研究了碳氢化合物含量对薄膜性能的影响。通过纳米压痕确定这些膜的硬度，结果表明放电中乙炔含量的最佳值使硬度最大化。还进行了拉曼光谱，测角仪和轮廓仪测量的分析，以确定膜生长参数与其结构和摩擦学性能之间的相关性。

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