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Influence of Thermal Treatment on the Microstructure and Electrical and Optical Properties of SnS Thin Films

机译:热处理对SnS薄膜微结构和电光性能的影响

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摘要

The influence of thermal treatment on the microstructure and electrical and optical properties of SnS films obtained by the "hot-wall" method has been investigated. It has been established that the thermal treatment does not lead to the formation of foreign phases in the film composition. The average film roughness after the thermal treatment increases from 10 to 20 nm. Resistivity after the thermal treatment decreases from 230 to 100 Ωcm (T = 300 K), while the temperature coefficient of thermopower increases from 40 to 330 μV K~(–1). The band gap is 1.46 eV. The adsorption edge is not displaced after the thermal treatment.
机译:研究了热处理对通过“热壁”法获得的SnS薄膜的微观结构以及电学和光学性能的影响。已经确定,热处理不会导致在薄膜组合物中形成异相。热处理后的平均膜粗糙度从10纳米增加到20纳米。热处理后的电阻率从230Ωcm降低到100Ωcm(T = 300 K),而热电的温度系数从40μVK〜(-1)增加。带隙为1.46 eV。热处理后,吸附边缘不会移位。

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