• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Plasma physics and controlled fusion >Plasma-based ion implantation: a valuable technology for the elaboration of innovative materials and nanostructured thin films
【24h】

Plasma-based ion implantation: a valuable technology for the elaboration of innovative materials and nanostructured thin films

机译：基于等离子体的离子注入：用于创新材料和纳米结构薄膜加工的宝贵技术

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Plasma-based ion implantation (PBII), invented in 1987, can now be considered as a mature technology for thin film modification. After a brief recapitulation of the principle and physics of PBII, its advantages and disadvantages, as compared to conventional ion beam implantation, are listed and discussed. The elaboration of thin films and the modification of their functional properties by PBII have already been achieved in many fields, such as microelectronics (plasma doping/PLAD), biomaterials (surgical implants, bio- and blood-compatible materials), plastics (grafting, surface adhesion) and metallurgy (hard coatings, tribology), to name a few. The major advantages of PBII processing lie, on the one hand, in its flexibility in terms of ion implantation energy (from 0 to 100 keV) and operating conditions (plasma density, collisional or non-collisional ion sheath), and, on the other hand, in the easy transferrability of processes from the laboratory to industry. The possibility of modifying the composition and physical nature of the films, or of drastically changing their physical properties over several orders of magnitude makes this technology very attractive for the elaboration of innovative materials, including metastable materials, and the realization of micro- or nanostructures. A review of the state of the art in these domains is presented and illustrated through a few selected examples. The perspectives opened up-by PBII processing, as well as its limitations, are discussed.
机译：1987年发明的基于等离子体的离子注入（PBII）现在可以被认为是用于薄膜改性的成熟技术。在简要回顾了PBII的原理和物理原理之后，列出并讨论了与常规离子束注入相比的优点和缺点。在许多领域，例如微电子学（等离子掺杂/ PLAD），生物材料（外科植入物，与生物和血液相容的材料），塑料（移植，表面附着力）和冶金学（硬涂层，摩擦学），仅举几例。 PBII处理的主要优势，一方面在于其在离子注入能量（0至100 keV）和操作条件（等离子密度，碰撞或非碰撞离子鞘）方面的灵活性，另一方面从实验室到工业过程的易转移性。改变膜的组成和物理性质，或在几个数量级上大幅度改变其物理性质的可能性，使得该技术对于制造包括亚稳材料在内的创新材料以及实现微米或纳米结构非常有吸引力。通过一些选定的示例，对这些领域的最新技术进行了概述和说明。讨论了由PBII处理打开的前景及其局限性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号