Structural Properties of the Epitaxial (SiC)_(1 - x)(AlN)_x Solid Solution Films Fabricated by Magnetron Sputtering of SiC-Al Composite Targets

Sh. M. Ramazanov; M. K. Kurbanov; G. K. Safaraliev; B. A. Bilalov; N. I. Kargin; A. S. Gusev

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Structural Properties of the Epitaxial (SiC)_(1 - x)(AlN)_x Solid Solution Films Fabricated by Magnetron Sputtering of SiC-Al Composite Targets

机译：磁控溅射SiC-Al复合靶材制备的外延（SiC）_（1-x）（AlN）_x固溶膜的结构性质

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Epitaxial layers of the (SiC)_(1 - x)(AlN)_x solid solution with x ≈ 0.12 and x = 0.64 without macroscopic structural distortions were grown using a new technique. It was established that the compositional dependences of crystal lattice parameters of the epitaxial films obey the Vegard's law with an error of ~0.03. This confirms that there is formation of isomorphic substitutional solid solutions in the SiC-AlN system.

机译：使用新技术生长了（SiC）_（1-x）（AlN）_x固溶体的外延层，其中x≈0.12，x = 0.64，没有宏观的结构变形。已经确定，外延膜的晶格参数的组成依赖性服从Vegard定律，误差为〜0.03。这证实了在SiC-AlN系统中形成了同构替代固溶体。

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《Technical physics letters: Letters to the Russian journal of applied physics》 |2014年第4期|共3页
作者
Sh. M. Ramazanov; M. K. Kurbanov; G. K. Safaraliev; B. A. Bilalov; N. I. Kargin; A. S. Gusev;
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正文语种 eng
中图分类工程物理学;物理学;
关键词
Structural; Targets; Properties;

机译：结构;目标;属性;

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1. Structural Properties of the Epitaxial (SiC)_(1 - x)(AlN)_x Solid Solution Films Fabricated by Magnetron Sputtering of SiC-Al Composite Targets [J] . Sh. M. Ramazanov, M. K. Kurbanov, G. K. Safaraliev, Technical physics letters: Letters to the Russian journal of applied physics . 2014,第4期

机译：磁控溅射SiC-Al复合靶材制备的外延（SiC）_（1-x）（AlN）_x固溶膜的结构性质
2. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [J] . Nierlly Galv?o, Marciel Guerino, Tiago Campos, Micromachines . 2019,第3期

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
3. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [J] . Nierlly Galv?o, Marciel Guerino, Tiago Campos, Micromachines . 2019,第3期

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
4. Reactive UHV Sputtering and Structural Characterization of Epitaxial AlN/6H-SiC(0001) Thin Films [C] . S. Tungasmitz, J. Birch, L. Hultman, International conference on silicon carbide, III-nitrides and related materials;ICSCIII-N'97 . 1998

机译：外延AlN / 6H-SiC（0001）薄膜的反应性UHV溅射及结构表征
5. Structure, mechanical and tribological properties of carbon nitride-based superlattice and titanium diboride-based composite films synthesized by magnetron sputtering. [D] . Wu, Mei-Ling. 1999

机译：磁控溅射合成氮化碳基超晶格和二硼化钛基复合膜的结构，力学和摩擦学性能。
6. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [O] . Nierlly Galvão, Marciel Guerino, Tiago Campos, 2016

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
7. Y-BA-CU-O FILMS BY RF MAGNETRON SPUTTERING USING SINGLE COMPOSITE TARGETS - SUPERCONDUCTING AND STRUCTURAL-PROPERTIES [O] . S. H. Liou 2011

机译：使用单个复合靶材通过RF磁控溅射Y-BA-CU-O薄膜-超导和结构特性

Structural Properties of the Epitaxial (SiC)_(1 - x)(AlN)_x Solid Solution Films Fabricated by Magnetron Sputtering of SiC-Al Composite Targets

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