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首页> 外文期刊>Talanta: The International Journal of Pure and Applied Analytical Chemistry >Direct determination of cadmium in solids using a capacitively coupled microwaveplasma atomic emission spectrometer
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Direct determination of cadmium in solids using a capacitively coupled microwaveplasma atomic emission spectrometer

机译：使用电容耦合微波等离子体原子发射光谱仪直接测定固体中的镉

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摘要

A capacitively coupled microwave plasma (CMP) operating at 800 W was examined for the direct determination of cadmium in solids. The laboratory-constructed system contained a tungsten cup electrode capable of holding microsanrple quantities. A low-powered plasma was used to heat the sample, while at higher powers the plasma was used for sample vaporization and excitation. This plasma enabled thermal vaporization (TV) sample introduction to be accomplished in situ as the plasma formed directly aroundthe sample. Thus, the need for sample preparation, procedural steps and sample transport was eliminated. This technique was capable of the direct determination of trace elements in solid samples in less than 5 min. The effects of experimental parameterssuch as gas flow rate, atomization power and electrode position were investigated. Detection limits obtained for Cd by TV-CMP-AES were in the picogram range with a relative standard deviation of <20%. The accuracy and precision of the method were also evaluated by measuring Cd in several NIST Standard Reference Materials.
机译：检查了在800 W下工作的电容耦合微波等离子体（CMP），用于直接测定固体中的镉。实验室建造的系统包含一个钨杯电极，能够容纳微量的钨。低功率等离子体用于加热样品，而高功率等离子体则用于样品蒸发和激发。这种等离子体使热汽化（TV）样品引入能够在等离子体直接围绕样品形成时就地完成。因此，消除了对样品制备，程序步骤和样品运输的需要。该技术能够在不到5分钟的时间内直接测定固体样品中的痕量元素。研究了气体流速，雾化功率和电极位置等实验参数的影响。通过TV-CMP-AES获得的Cd的检出限在皮克范围内，相对标准偏差<20％。还通过在几种NIST标准参考材料中测量Cd来评估该方法的准确性和精密度。

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