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首页> 外文期刊>Surface & Coatings Technology >Influence of substrate bias, deposition temperature and post-deposition annealing on the structure and properties of multi-principal-component (AlCrMoSiTi)N coatings
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Influence of substrate bias, deposition temperature and post-deposition annealing on the structure and properties of multi-principal-component (AlCrMoSiTi)N coatings

机译：基材偏压，沉积温度和沉积后退火对多主要成分（AlCrMoSiTi）N涂层的结构和性能的影响

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Nitride films are deposited from a single equiatomic AlCrMoSiTi target by reactive DC magnetron sputtering. The influence of the substrate bias and deposition temperature on the coating structure and properties are investigated. The bias is varied from 0 to -200 V while maintaining a substrate temperature of 573 K. And the temperature is changed from 300 to 773 K whilst maintaining a substrate bias of - 100 V From X-ray diffraction analysis, it is found that all the as-deposited coatings are of a single phase with NaCl-type FCC structure. This is attributed to the high mixing entropy of AlN, CrN, MoN, SiN, and TiN, and the limited diffusion kinetics during coating growth. Specific aspects of the coating, namely the grain size, lattice constant and compressive stress, are seen to be influenced more by substrate bias than deposition temperature. In fact, it is possible to classify the deposited films as large grained (similar to 15 nm) with a reduced lattice constant (similar to 4.15 angstrom) and low compressive residual stresses for lower applied substrate biases, and as small grained (similar to 4 mn) with an increased lattice constant (similar to 4.25 angstrom) and high compressive residual stresses for applied biases of - 100 V or more. A good correlation between the residual stress and lattice constant under various deposition conditions is found. For the coatings deposited at - 100 V, and at temperatures above 573 K, the hardness could attain to the range of 32 to 35 GPa. Even after annealing in vacuum at 1173 K for 5 h, there is no notable change in the as-deposited phase, grain size or lattice constant of the coatings but an increase in hardness. The thermal stability of microstructure is considered to be a result of the high mixing entropy and sluggish diffusion of these multi-component coatings. For the anneal hardening it is proposed that the overall bonding between target elements and nitrogen is enhanced by thermal energy during annealing. (c) 2007 Elsevier B.V. All rights reserved.
机译：通过反应性直流磁控溅射从单个等原子的AlCrMoSiTi靶沉积氮化膜。研究了基材偏压和沉积温度对涂层结构和性能的影响。偏压在0到-200 V的范围内变化，同时保持573 K的衬底温度。温度在300到773 K的范围内，同时保持-100 V的衬底偏压。从X射线衍射分析发现，所有所沉积的涂层是具有NaCl型FCC结构的单相涂层。这归因于AlN，CrN，MoN，SiN和TiN的高混合熵，以及涂层生长过程中有限的扩散动力学。涂层的特定方面，即晶粒尺寸，晶格常数和压应力，受基材偏压的影响比沉积温度的影响更大。实际上，可以将沉积的薄膜分类为大晶粒（近似15 nm），晶格常数降低（近似4.15埃），压缩残余应力低，以降低施加的基材偏压;小晶粒（近似4）。 mn）具有更高的晶格常数（类似于4.25埃），并且在施加-100 V或更高的偏压时具有较高的压缩残余应力。发现在各种沉积条件下残余应力与晶格常数之间具有良好的相关性。对于在-100 V和高于573 K的温度下沉积的涂层，硬度可以达到32至35 GPa。即使在1173 K的真空下退火5小时后，涂层的沉积态，晶粒尺寸或晶格常数也没有明显变化，但硬度增加。微观结构的热稳定性被认为是这些多组分涂层的高混合熵和缓慢扩散的结果。对于退火硬化，提出在退火过程中通过热能增强目标元素和氮之间的整体结合。 （c）2007 Elsevier B.V.保留所有权利。

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