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首页> 外文期刊>Surface Engineering >Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process
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Low roughness thin diamond films produced at moderate temperatures using microwave plasma assisted chemical vapour deposition process

机译：使用微波等离子体辅助化学气相沉积工艺在中等温度下生产的低粗糙度金刚石薄膜

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摘要

Diamond coatings on pure titanium substrates are of interest for tribological and biomedical implants; however, due to different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving very high nucleation density, it is hard to deposit adherent thin diamond layers on titanium. The aim of this research work is to successfully produce smooth and well adherent diamond coatings on a pure Ti substrate using the microwave plasma chemical vapour deposition (MWPCVD) method. The effects of applying two kinds of gas mixtures (H_2/CH_4 and Ar/H_2/CH_4) during diamond deposition on the pure Ti substrate are studied. The morphology, surface roughness, diamond crystal orientation and purity are obtained by characterising the sample with field emission electron microscopy (FESEM), atomic force microscopy (AFM), X-ray diffraction (XRD) and Raman spectroscopy respectively.
机译：纯钛基底上的金刚石涂层对于摩擦学和生物医学植入物很重要。但是，由于两种材料的热膨胀系数不同，金刚石沉积过程中形成的中间层的复杂性质以及难以获得非常高的成核密度，很难在钛上沉积粘附的金刚石薄层。这项研究工作的目的是使用微波等离子体化学气相沉积（MWPCVD）方法在纯Ti基材上成功生产出光滑且附着力强的金刚石涂层。研究了在纯钛衬底上金刚石沉积过程中施加两种气体混合物（H_2 / CH_4和Ar / H_2 / CH_4）的效果。样品的形貌，表面粗糙度，金刚石晶体取向和纯度分别通过场发射电子显微镜（FESEM），原子力显微镜（AFM），X射线衍射（XRD）和拉曼光谱进行表征。

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