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Analyses of plasma reactive sputter deposition of CN_x films by OES

机译：用OES分析CN_x薄膜的等离子体反应溅射沉积。

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OPTICAL emission spectroscopy (OES) is generally used in diagnosis on the various plasma film deposition processes to understand the mechanism of film growth. However, although the deposition precursors have been predicted such as CN radicals and nitrogen atoms, up to now no diagnostic work on CN_x. film deposition process, as we know, has been reported yet. From previously reported research work, the properties of CN_x film display some obvious difference. For instance, some CN_x films have extrememechanical properties with hardness of 60 GPa while other hardness was about several GP determined by nanoindentation, which, as we consider, is largely related to the distribution of species and chemical reactions in plasma. In this note, we report thediagnosis analyses of plasma reactive sputter deposition of CN_x films by OES and analyze the effects of deposition condition on the properties of the films.
机译：光学发射光谱法（OES）通常用于各种等离子膜沉积过程的诊断中，以了解膜生长的机理。然而，尽管已经预言了诸如CN基团和氮原子之类的沉积前体，但到目前为止，尚无关于CN_x的诊断工作。据我们所知，膜沉积工艺尚有报道。从先前报道的研究工作来看，CN_x薄膜的性能显示出一些明显的差异。例如，某些CN_x膜具有极高的机械性能，硬度为60 GPa，而其他硬度约为通过纳米压痕确定的几个GP，我们认为，这在很大程度上与等离子体中的物种分布和化学反应有关。在本文中，我们报道了用OES对CN_x薄膜进行等离子体反应溅射沉积的诊断分析，并分析了沉积条件对薄膜性能的影响。

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