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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning
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Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning

机译：由具有最佳弹性模量的聚氨酯丙烯酸酯制成的共形相位掩模，用于3D纳米图案

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摘要

The pattern resolution of soft lithographic techniques is critically determined by the elastic modulus of the soft mold that can support fine and high-aspect-ratio features with conformal adhesion to target substrates. We present a strategy to fine-tune the elastic modulus of conformal molds made of polyurethane acrylate by optimizing the chemical structures and the composition of prepolymer and modulator. Trimethylolpropane ethoxylated (15) triacrylate plays a key role as a delicate modulator for increasing the elastic modulus of soft aliphatic urethane diacrylate oligomer with its low cross-linking density. The optimized molds have sufficiently high elastic modulus (>23 MPa) for defect-free replication of dense, high-aspect-ratio (>2) nanopillars and nanotrench structures while still preserving their conformality. The conformal mold with good mechanical and optical properties can serve as a semi-permanently usable optical phase mask with a wide range of phase modulations for generating three-dimensional (3D) nanostructures with high precision.
机译：软光刻技术的图案分辨率主要取决于软模具的弹性模量，该模具可以支持精细和高纵横比的特征，并与目标基板形成共形粘合。我们提出了一种通过优化化学结构以及预聚物和调节剂的成分来微调聚氨酯丙烯酸酯共形模具的弹性模量的策略。三羟甲基丙烷乙氧基化（15）三丙烯酸酯起着微妙的调节剂的作用，它以较低的交联密度提高了软脂族聚氨酯二丙烯酸酯低聚物的弹性模量。优化的模具具有足够高的弹性模量（> 23 MPa），可以无缺陷地复制致密，高纵横比（> 2）的纳米柱和纳米沟槽结构，同时仍保持其保形性。具有良好机械和光学性能的共形模具可以用作具有多种相位调制范围的半永久性光学相位掩模，以高精度地生成三维（3D）纳米结构。

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