【24h】

Influence of substrate texture on microstructure and photovoltaic performances of thin film polycrystalline silicon solar cells

机译:衬底纹理对薄膜多晶硅太阳能电池微结构和光伏性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Thin film polycrystalline silicon (poly-Si) solar cells have been fabricated by plasma enhanced chemical vapor deposition on differently textured ZnO/Ag/SnO2/glass substrates. Using a textured substrate with the root mean square (RMS) roughness (sigma) of 38 nm. the conversion efficiency of 8.22% has been achieved due to improvement of long wavelength responses. Whereas using textured substrates with sigma > 38 nm. (220) preferential growth is deteriorated, yielding decreases in both short circuit current and open circuit voltage. The field-dependent carrier collection behaviors reveal that the carrier diffusion length in the poly-Si layer on textured substrates with sigma > 38 nm decreases due to the change in poly-Si microstructure. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 10]
机译:薄膜多晶硅(poly-Si)太阳能电池是通过在不同纹理的ZnO / Ag / SnO2 /玻璃衬底上进行等离子增强化学气相沉积而制成的。使用均方根(RMS)粗糙度(sigma)为38 nm的纹理化基材。由于改善了长波长响应,因此转换效率达到了8.22%。而使用sigma> 38 nm的纹理化基材。 (220)优先生长恶化,短路电流和开路电压均降低。依赖于场的载流子收集行为表明,由于多晶硅微结构的变化,σ> 38 nm的织构衬底上的多晶硅层中的载流子扩散长度减小。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:10]

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号