Fabrication of circular sawtooth gratings using focused UV lithography

Mi Wujun; Karlsson Staffan; Holmberg Anders; Danielsson Mats; Nillius Peter

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Fabrication of circular sawtooth gratings using focused UV lithography

机译：使用聚焦紫外光刻技术制造圆形锯齿形光栅

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This paper presents a novel micro-fabrication method using focused ultraviolet (UV) light to manufacture three-dimensional sawtooth structures in ultra -thick negative photoresist to fabricate a novel multi -prism x-ray lens, The method uses a lens to shape the UV beam instead of the photomask conventionally used in UV lithography. Benefits of this method include the ability to manufacture sawtooth structures in free form, for example in circular shapes as well as arrays of these shapes, and in resist that is up to 76 pm thick,

机译：本文提出了一种利用聚焦紫外光在超厚负性光刻胶中制造三维锯齿结构的新型微加工方法，以制造新型的多棱镜x射线透镜，该方法使用透镜对紫外线进行整形。用光束代替紫外光刻中常用的光掩模。这种方法的优点包括能够制造自由形式的锯齿结构，例如圆形以及这些形状的阵列，并且可以制造厚度不超过76 pm的抗蚀剂，

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《Journal of Micromechanics and Microengineering》 |2016年第3期|共7页
作者
Mi Wujun; Karlsson Staffan; Holmberg Anders; Danielsson Mats; Nillius Peter;
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正文语种 eng
中图分类微电子学、集成电路（IC）;
关键词
focused UV lithography; three-dimensional sawtooth structures; SU-8; UV lens; Fourier optics;

机译：聚焦紫外光刻;三维锯齿结构;SU-8;紫外透镜;傅立叶光学;

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1. Fabrication of circular sawtooth gratings using focused UV lithography [J] . Mi Wujun, Karlsson Staffan, Holmberg Anders, Journal of Micromechanics and Microengineering . 2016,第3期

机译：使用聚焦紫外光刻技术制造圆形锯齿形光栅
2. Deterministic fabrication of circular Bragg gratings coupled to single quantum emitters via the combination of in-situ optical lithography and electron-beam lithography [J] . Kolatschek S., Hepp S., Sartison M., Journal of Applied Physics . 2019,第4期

机译：通过原位光学光刻和电子束光刻相结合的确定性制造与单个量子发射器耦合的圆形布拉格光栅
3. Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing [J] . J.D. Jambreck, H. Schmitt, B. Amon, Microelectronic Engineering . 2010,第5a8期

机译：通过结合紫外线纳米压印光刻和聚焦离子束加工来制造金属SPM尖端
4. Fabrication and replication of high efficiency blazed gratings with grayscale electron beam lithography and UV nanoimprint lithography [C] . Marie-Aline Mattelin, Ana Radosavljevic, Jeroen Missinne, Conference on Advanced Fabrication Technologies for Micro/Nano Optics and Photonics . 2020

机译：灰度电子束光刻和紫外纳米压印光刻技术制备和复制高效闪耀光栅
5. Focusing, wavelength tuning, beam steering and beam shaping of circular grating surface emitting distributed Bragg reflector lasers. [D] . Penner, Robert Scott. 1999

机译：圆形光栅表面发射分布式布拉格反射器激光器的聚焦，波长调谐，光束控制和光束整形。
6. UV Lithography-Assisted Fabrication of Low-Cost CopperElectrodes Modified with Gold Nanostructures for Improved AnalyteDetection [O] . Jagriti Gupta, Subhavna Juneja, Jaydeep Bhattacharya 2020

机译：紫外光刻辅助低成本铜的制备金纳米结构修饰的电极用于改进分析物检测
7. Fabrication and replication of high efficiency blazed gratings with grayscale electron beam lithography and UV nanoimprint lithography [O] . Marie-Aline Mattelin, Ana Radosavljevic, Jeroen Missinne, 2020

机译：高效闪光光栅的制造与复制灰度电子束光刻和UV纳米压印光刻
8. Focussed ion beam lithography using a MeV proton beam microprobe for microoptics fabrication [R] . Mason, L. M. , Roberts, A. , Jamieson, D. N. , 1995

机译：聚焦离子束光刻使用meV质子束微探针进行微光学制造

Fabrication of circular sawtooth gratings using focused UV lithography

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