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首页> 外文期刊>Journal of Micromechanics and Microengineering >Micro-ano-lithography based on the contact transfer of thin film and mask embedded etching
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Micro-ano-lithography based on the contact transfer of thin film and mask embedded etching

机译：基于薄膜的接触转移和掩膜嵌入式蚀刻的微/纳米光刻

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摘要

This paper reports a simple but useful contact imprinting method for micro- and nano-patterning and fabrication. It utilizes an anti-adhesion layer to release a patterned metal film from a mold to a polymer layer deposited on a substrate. The transferred metal pattern then serves as an etching mask for subsequent etching on the polymer layer to complete the patterning and fabrication processes. Experimental tests have been successfully carried out on several samples with linear grating and dot-arrayed features with the feature size ranging from 65 nm to 500 nm. The strength of this method is in its simplicity, ease of implementation and flexibility, which paves the way for fabricating submicron- and nano-structures on different substrates without using sophisticated and expensive facilities.
机译：本文报道了一种简单而有用的接触压印方法，用于微米和纳米图案的制作。它利用防粘层将图案化的金属膜从模具释放到沉积在基材上的聚合物层上。然后，转移的金属图案用作蚀刻掩模，用于随后在聚合物层上的蚀刻以完成图案化和制造过程。已经成功地对具有线性光栅和点阵特征且特征尺寸范围为65 nm至500 nm的多个样品进行了实验测试。该方法的优势在于其简单性，易于实施性和灵活性，这为在不使用复杂而昂贵的设备的情况下在不同基板上制造亚微米和纳米结构铺平了道路。

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