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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Growth of p-type ZnO thin films by (N, Ga) co-doping using DMHy dopant
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Growth of p-type ZnO thin films by (N, Ga) co-doping using DMHy dopant

机译:使用DMHy掺杂剂通过(N,Ga)共掺杂生长p型ZnO薄膜

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摘要

We investigate p-type doping in ZnO prepared by metal-organic chemical vapour deposition with dimethylhydrazine (DMHy) as the nitrogen dopant source. Results obtained by x-ray photoelectron spectroscopy show that DMHy exhibits a narrow temperature window from 500 to 550 degrees C for efficient nitrogen incorporation and that nitrogen doping is critically influenced by growth conditions, e.g. the N/Ga flux ratio in growth. Within an appropriate N/Ga flux ratio range, p-type ZnO can be realized. The effect of the N/Ga flux ratio on the conductivity conversion of ZnO is reported. The extrinsic nitrogen acceptor level is calculated to be about 160 meV from low-temperature photoluminescence spectra.
机译:我们研究了以二甲基肼(DMHy)为氮掺杂源的金属有机化学气相沉积制备的ZnO中的p型掺杂。通过X射线光电子能谱获得的结果表明,DMHy在500至550摄氏度之间显示出窄的温度范围,以有效地掺入氮,并且氮掺杂受生长条件(例如生长温度)的严重影响。生长中的N / Ga通量比。在适当的N / Ga通量比范围内,可以实现p型ZnO。报道了N / Ga通量比对ZnO的电导率转化的影响。从低温光致发光光谱计算出,外部氮受体水平为约160meV。

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