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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
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Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering

机译：旋转圆柱磁控溅射过程中沉积物对反应溅射行为的影响

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摘要

A key feature of a rotating cylindrical magnetron is the changing race track position due to target rotation. To study the reactive magnetron sputtering of aluminium for this magnetron type, so-called sputter cleaning experiments were designed. In these experiments, the target was first sputtered without rotating the target. After this treatment, the target was sputter cleaned in pure argon while rotating the target. In the meantime, the discharge voltage was recorded as a function of time. The obtained results can be understood by including compound deposition on the target as an extra mechanism for target poisoning.
机译：旋转圆柱形磁控管的关键特征是由于目标旋转而改变了赛道的位置。为了研究这种磁控管类型的铝的反应性磁控管溅射，设计了所谓的溅射清洁实验。在这些实验中，首先溅射靶而不旋转靶。在该处理之后，在旋转靶的同时将靶在纯氩中溅射清洗。同时，放电电压被记录为时间的函数。通过将化合物沉积在靶标上作为靶标中毒的额外机制，可以理解所获得的结果。

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