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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Modelling wafer bow in silicon-polycrystalline CVD diamond substrates for GaN-based devices
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Modelling wafer bow in silicon-polycrystalline CVD diamond substrates for GaN-based devices

机译:在基于GaN的器件的硅多晶CVD金刚石衬底中建模晶圆弓形

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摘要

Composite silicon-polycrystalline chemical vapour deposition (CVD) diamond wafers are potential substrates for GaN-based devices for use in harsh environments due to their high thermal conductivity and chemical stability. When cooled from a typical diamond deposition temperature of approximately 800 to 25 °C wafer bowing arises from a mismatch in the coefficients of thermal expansion of silicon and polycrystalline diamond. In this paper 100 mm diameter silicon-polycrystalline diamond wafers have been modelled using ANSYS finite element software to investigate their bowing behaviour as a function of temperature and geometry. The maximum bow of a wafer occurred where the thicknesses of both the silicon and polycrystalline diamond layers was almost identical; this has been confirmed using analytical methods. Strategies are discussed for reducing wafer bow.
机译:复合硅多晶化学气相沉积(CVD)金刚石晶圆由于其高导热性和化学稳定性而成为潜在的GaN基器件的衬底,可用于恶劣的环境。当从大约800到25°C的典型金刚石沉积温度冷却时,晶圆弯曲是由硅和多晶金刚石的热膨胀系数不匹配引起的。在本文中,已使用ANSYS有限元软件对直径为100 mm的硅多晶金刚石晶片进行建模,以研究其弯曲行为随温度和几何形状的变化。在硅和多晶金刚石层的厚度几乎相同的情况下,发生晶片的最大弯曲。这已经通过分析方法得到证实。讨论了减少晶圆弯曲的策略。

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