...
首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >Design of the aspheric Schwarzschild lens for a nanolithographer with the operating wavelength λ = 13.5 nm
【24h】

Design of the aspheric Schwarzschild lens for a nanolithographer with the operating wavelength λ = 13.5 nm

机译:用于纳米光刻机的非球面Schwarzschild透镜的设计,其工作波长λ= 13.5 nm

获取原文
获取原文并翻译 | 示例
           

摘要

The design of an aspheric Schwarzschild lens applicable to a nanolithographic test bench with an operating wavelength of 13.5 nm is discussed. Lenses with numerical apertures of 0.3 and 0.4 are examined. The influence of lens aberrations and deviations of optical scheme parameters from rated values on the image quality is analyzed.
机译:讨论了适用于工作波长为13.5 nm的纳米光刻试验台的非球面Schwarzschild透镜的设计。检查数值孔径为0.3和0.4的镜头。分析了透镜像差和光学方案参数与额定值的偏差对图像质量的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号