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Plasma-etched organic layers for antireflection purposes

机译:等离子刻蚀的有机层用于防反射

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摘要

Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.
机译:有机层可用于实现光学干涉涂层中的特殊功能。热蒸发并表征用于此类层的合适化合物。应用等离子体蚀刻程序以在有机层的顶部上产生纳米结构,以降低其有效折射率。宽带抗反射涂层是通过将这些人造低折射率层与常规制备的干涉叠层组合而成的。

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