Fabrication of quasiperiodic nanostructures with EUV interference lithography

Langner A.; P?iv?nranta B.; Terhalle B.; Ekinci Y.

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Fabrication of quasiperiodic nanostructures with EUV interference lithography

机译：利用EUV干涉光刻技术制备准周期纳米结构

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We demonstrate the fabrication and analysis of well-ordered high-resolution quasiperiodic nanostructures with feature sizes down to a few tens of nanometers using extreme ultraviolet interference lithography. A well-controlled mask manufacturing process for producing high quality transmission diffraction masks enables simple and fast fabrication of highly ordered 2D quasiperiodic structures using 5-and 8-beam interference setups.

机译：我们使用极端的紫外线干涉光刻技术，演示了特征尺寸低至几十纳米的有序高分辨率高分辨率拟周期纳米结构的制造和分析。一种用于生产高质量透射衍射掩模的受良好控制的掩模制造工艺，可以使用5束和8束干涉装置简单快速地制造高度有序的2D准周期性结构。

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《Nanotechnology》 |2012年第10期|共6页
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Langner A.; P?iv?nranta B.; Terhalle B.; Ekinci Y.;
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1. Fabrication of quasiperiodic nanostructures with EUV interference lithography [J] . Langner A., P?iv?nranta B., Terhalle B., Nanotechnology . 2012,第10期

机译：利用EUV干涉光刻技术制备准周期纳米结构
2. Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Japanese journal of applied physics . 2019,第SD期

机译：使用DDR工艺制造高纵横比传动光栅10nm EUV抗蚀剂评估通过EUV干扰光刻
3. Fabrication of High-Aspect-Ratio Transmission Grating Using DDR Process for 10-nm EUV Resist Evaluation by EUV Interference Lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Journal of Photopolymer Science and Technology . 2018,第2期

机译：使用DDR工艺制造高纵横比传动光栅通过EUV干扰光刻使用DDR工艺进行10-NM EUV抵抗评估
4. Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography [C] . Y.Ekinci, H.H.Solak, C. David, Optomechatronic Micro/Nano Devices and Components III; Proceedings of SPIE-The International Society for Optical Engineering; vol.6717 . 2007

机译：EUV干涉光刻技术制造的铝等离子纳米结构
5. Laser interference lithography for large area patterning and the fabrication of functional nanostructures [D] . Wathuthanthri, Ishan 2015

机译：激光干涉光刻技术，用于大面积构图和功能纳米结构的制造
6. The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography [O] . Jun Wu, Zhaoxin Geng, Yiyang Xie, 2019

机译：激光干涉光刻技术在聚二甲基硅氧烷上制备纳米结构
7. Breaking symmetries in ordered materials : spin polarized light transport in magnetized noncentrosymmetric 1D photonic crystals, and photonic gaps and fabrication of quasiperiodic structured materials from interference lithography [O] . Bita Ion 2006

机译：有序材料中的对称性破裂：磁化非中心对称1D光子晶体中的自旋偏振光传输，光子间隙和干涉光刻制备准周期结构材料

Fabrication of quasiperiodic nanostructures with EUV interference lithography

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