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首页> 外文期刊>Nanotechnology >A strain-tunable nanoimprint lithography for linear variable photonic crystal filters
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A strain-tunable nanoimprint lithography for linear variable photonic crystal filters

机译：用于线性可变光子晶体滤光片的应变可调纳米压印光刻

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摘要

This paper presents the fabrication methodology of a linear variable photonic crystal (PC) filter with narrowband reflection that varies over a broad spectral range along the length of the filter. The key component of the linear variable PC filter is a polymer surface-relief grating whose period changes linearly as a function of its position on the filter. The grating is fabricated using a nanoreplica molding process with a wedge-shaped elastomer mold. The top surface of the mold carries the grating pattern and the wedge is formed by a shallow angle between the top and bottom surfaces of the mold. During the replica molding process, a uniaxial force is applied to stretch the mold, resulting in a nearly linearly varying grating period. The period of the grating is determined using the magnitude of the force and the local thickness of the mold. The grating period of the fabricated device spans a range of 421.8-463.3 nm over a distance of 20 mm. A high refractive index dielectric film is deposited on the graded-period grating to act as the waveguide layer of the PC device. The resonance reflection feature of the device varies linearly in a range of 680.2-737.0 nm over the length of the grating.
机译：本文介绍了一种线性可变光子晶体（PC）滤光片的制造方法，该滤光片具有窄带反射，该滤光片沿滤光片的长度在很宽的光谱范围内变化。线性可变PC滤波器的关键组件是聚合物表面浮雕光栅，其周期根据其在滤波器上的位置而线性变化。使用纳米复制品模制工艺和楔形弹性体模具制造光栅。模具的顶表面带有光栅图案，并且楔由模具的顶表面和底表面之间的浅角度形成。在复制品成型过程中，施加单轴力以拉伸模具，从而导致光栅周期几乎呈线性变化。使用力的大小和模具的局部厚度确定光栅的周期。所制造器件的光栅周期在20mm的距离上跨越421.8-463.3nm的范围。高折射率介电膜沉积在渐变周期光栅上，以充当PC器件的波导层。该装置的共振反射特征在整个光栅长度上在680.2-737.0 nm的范围内线性变化。

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