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Effective method to study the thickness-dependent dielectric functions of nanometal thin film

机译：研究纳米金属薄膜随厚度变化的介电函数的有效方法

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A new method for measuring the dielectric functions change with the thickness of nanometal thin films was proposed. To confirm the accuracy and reliability of the method, a nano-thin wedge-shaped gold (Au) film with continuously varied thicknesses was designed and prepared on K9 glass by direct-current-sputtering (DC-sputtering). The thicknesses and the dielectric functions in the wavelength range of 300-1100 nm of the nano-thin Au films were obtained by fitting the ellipsometric parameters with the Drude and critical points model. Results show that while the real part of the dielectric function (epsilon(1)) changes marginally with increasing film thickness, the imaginary part (epsilon(2)) decreases drastically with the film thickness, approaching a stable value when the film thickness increases up to about 42 nm. This method is particularly useful in the study of thickness-dependent optical properties of nano-thin film. (C) 2016 Optical Society of America
机译：提出了一种测量介电函数随纳米金属薄膜厚度变化的新方法。为了证实该方法的准确性和可靠性，设计了厚度连续变化的纳米级楔形金（Au）薄膜，并通过直流溅射（DC溅射）在K9玻璃上制备了该薄膜。通过将椭偏参数与德鲁德和临界点模型拟合，获得了纳米金薄膜在300-1100 nm波长范围内的厚度和介电函数。结果表明，虽然介电函数的实部（epsilon（1））随膜厚的增加而略有变化，但虚部（epsilon（2））随膜厚的增加而急剧下降，当膜厚增加时，其逼近稳定值至约42nm。该方法在研究纳米薄膜的厚度依赖性光学特性方面特别有用。 （C）2016美国眼镜学会

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