首页> 外文会议>Conference on Challenges in Process Integration and Device Technology 18-19 September 2000 Santa Clara, USA >Thickness-dependent optical and dielectric behaviors of low-k polymer thin films
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Thickness-dependent optical and dielectric behaviors of low-k polymer thin films

机译:低k聚合物薄膜的厚度依赖性光学和介电行为

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A study of both thickness dependent optical and dielectric properties of a low-dielectric constant (low-k)polycrystalline polymer thin film is investigated. It is demonstrated that the refractive index increase with increasing film thickness, but for thickness < 200 nm, abnormal decrease of the refractive index with increasing film thickness is observed. It is also found that the dielectric strength has a strong dependence on film thickness, which decrease with increasing film thickness. Optical spectroscpy and current ramping voltage test are involved to investigate thickness dependence of optical and dielectric properties. The observations are discussed in term of our and other models for film thickness dependent of dielectric strength as well as refractive index .
机译:研究了低介电常数(低k)多晶聚合物薄膜的厚度依赖的光学和介电性能的研究。已经证明折射率随膜厚度的增加而增加,但是对于厚度<200nm,观察到折射率随膜厚度的增加而异常降低。还发现介电强度对膜厚度具有很强的依赖性,其随膜厚度的增加而降低。涉及光谱和电流斜坡电压测试,以研究厚度的光学和介电特性。我们将根据我们的模型和其他模型对这些观察结果进行讨论,这些模型取决于绝缘强度和折射率对薄膜厚度的影响。

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