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首页> 外文期刊>Physica, B. Condensed Matter >Control of the stacking fault areas in pseudomorphic ZnSe layers by photo-molecular beam epitaxy
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Control of the stacking fault areas in pseudomorphic ZnSe layers by photo-molecular beam epitaxy

机译:用光分子束外延控制伪晶ZnSe层中的堆垛层错区域

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Pseudomorphic ZnSe layers on GaAs(001) were grown by molecular beam epitaxy under the light illumination with photon energy of about 1.8 eV. In the layers, isolated Shockley-type stacking faults on (111), bordering not on the ZnSe/GaAs interface but on the ZnSe surface, as well as the well-known stacking fault pairs, were formed. The sum of the stacking fault areas was small in comparison with the layers grown by molecular beam epitaxy without light illumination. (C) 2007 Elsevier B.V. All rights reserved.
机译:通过分子束外延在光子能量约为1.8 eV的光照射下,在GaAs(001)上生长拟态ZnSe层。在这些层中,形成了(111)上的隔离的Shockley型堆积层断层,该边界层不与ZnSe / GaAs界面邻接,而与ZnSe表面邻接,以及众所周知的堆积层对。与没有光照射的分子束外延生长的层相比,堆垛层错面积的总和很小。 (C)2007 Elsevier B.V.保留所有权利。

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