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首页> 外文期刊>Nanotechnology >Plasmonic color filters fabricated via oxide-based nanotransfer printing
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Plasmonic color filters fabricated via oxide-based nanotransfer printing

机译：通过基于氧化物的纳米转器印刷制造的等离子体滤色器

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摘要

Plasmonic filters have recently become a topic of significant interest because they are suitable for a wide range of applications. However, effective fabrication of plasmonic filters remains a challenge. In this paper, we demonstrate a simple method for fabricating plasmonic color filters based on nanotransfer printing (nTP), using SiO2 as a hard mask for Al etching. nTP was performed on a 100 nm Al layer deposited on a glass wafer substrate with a 10 nm Al layer and a 20 nm SiO2 layer with a nanohole pattern. The 10 nm Al layer and 20 nm SiO2 layers were previously transferred from a polymer stamp prepared to create patterns of subwavelength-sized holes. The plasmonic filters were ultimately fabricated using the SiO2 layer as a hard mask to selectively etch the Al layer. The optical properties of the fabricated plasmonic filters were evaluated using experimental and simulation tools. In addition, we analyzed the results of nTP on the Al and SiO2 films by varying the temperature, pressure, and SiO2-film thickness. We believe that this technique is a promising method for fabricating nanostructures and for widening the scope of practical application of plasmonics because of its high efficiency and cost-effectiveness.
机译：等离子体过滤器最近成为一个重要兴趣的主题，因为它们适用于各种应用。然而，有效制造等离子体过滤器仍然是一个挑战。在本文中，我们证明了一种简单的方法，用于基于纳米转换印刷（NTP）制造等离子体滤色器，使用SiO2作为用于Al蚀刻的硬掩模。在沉积在玻璃晶片衬底上的100nm Al层上进行NTP，其具有10nm Al层和具有纳米孔图案的20nm SiO 2层。预先从制备的聚合物印模转印到制备的聚合物印模，以产生亚波长型孔的图案，将10nM Al层和20nm SiO 2层。最终使用SiO 2层作为硬掩模来制造等离子体过滤器以选择性地蚀刻Al层。使用实验和仿真工具评估制造的等离子体过滤器的光学性质。此外，我们通过改变温度，压力和SiO 2膜厚度分析了Al和SiO 2膜上的NTP的结果。我们认为，这种技术是制造纳米结构的有希望的方法，并且由于其高效率和成本效益而加宽了血浆的实际应用范围。

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