Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

Jithin M. A.; Ganapathi Kolla Lakshmi; Vikram G. N. V. R.; Udayashankar N. K.; Mohan S.

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Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

机译：脉冲DC磁控磁控溅射钛氮化膜，用于MEMS器件中的局部加热应用

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Titanium nitride (TiN) thin films are deposited on Si/SiO2 substratesby using Pulsed DC magnetron sputtering and are characterized for their structural, mechanical and electrical properties for their application as localized heating elements in microsystem devices. The influence of substrate temperature on the properties of TiN films has been investigated. The correlation between the structural orientation with mechanical and electrical properties has been established. The films deposited at a substrate temperature of 300 degrees C have shown better structural, mechanical and electrical properties. This film has been chosen for the fabrication of microheater and its characterization. A maximum temperature of 250 degrees C is achieved by applying a power of 2.8 W to the microheater. (C) 2018 Elsevier B.V. All rights reserved.

机译：使用脉冲DC磁控溅射沉积氮化钛（锡）薄膜沉积在Si / SiO 2基材上，其特征在于它们的结构，机械和电性能，其应用于微系统装置中的局部加热元件。研究了基础温度对锡膜性能的影响。已经建立了具有机械和电性能的结构取向之间的相关性。沉积在300℃的衬底温度下的薄膜显示出更好的结构，机械和电性能。已选择该薄膜用于制造微热器及其表征。通过将2.8W的功率施加到微热器来实现250℃的最大温度。（c）2018年elestvier b.v.保留所有权利。

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《Sensors and Actuators, A. Physical》 |2018年第2018期|共7页
作者
Jithin M. A.; Ganapathi Kolla Lakshmi; Vikram G. N. V. R.; Udayashankar N. K.; Mohan S.;
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作者单位

Indian Inst Sci Ctr Nano Sci &

Engn Bangalore 560012 Karnataka India;

Indian Inst Technol Dept Phys Madras 600036 Tamil Nadu India;

Vignan Univ Dept Elect &

Commun Engn Vadlamudi 522213 Guntur India;

Natl Inst Technol Karnataka Dept Phys Mangalore 575025 India;

Indian Inst Sci Ctr Nano Sci &

Engn Bangalore 560012 Karnataka India;

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原文格式 PDF
正文语种 eng
中图分类 TP212.1;
关键词
Thin films; Pulsed dc magnetron sputtering; Titanium nitride; Resistivity; Microheater;

机译：薄膜;脉冲DC磁控溅射;氮化钛;电阻率;微热器;

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1. 频率和脉冲时间对大功率脉冲磁控溅射氮化钛沉积速率和形貌的影响 [J] . Saeed GHASEMI, Ali Reza FARHADIZADEH, Hamid GHOMI 中国有色金属学报（英文版） . 2019,第012期
2. 频率和脉冲时间对大功率脉冲磁控溅射氮化钛沉积速率和形貌的影响 [J] . Saeed GHASEMI, Ali Reza FARHADIZADEH, Hamid GHOMI 中国有色金属学报：英文版 . 2019,第012期
3. Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices [J] . Jithin M. A., Ganapathi Kolla Lakshmi, Vikram G. N. V. R., Sensors and Actuators, A. Physical . 2018,第期

机译：脉冲DC磁控磁控溅射钛氮化膜，用于MEMS器件中的局部加热应用
4. Nanosize-Controlled Titanium Nitride Films in Pulsed dc Magnetron Sputtering [J] . Sung-Yong Chun Journal of nanoscience and nanotechnology . 2013,第3期

机译：直流磁控溅射纳米控制的氮化钛薄膜
5. Surface textured ZnO:Al thin films by pulsed DC magnetron sputtering for thin film solar cells applications [J] . W.T.Yen, Y.C.Lin, J.H.Ke Applied Surface Science . 2010,第3期

机译：脉冲直流磁控溅射表面织构的ZnO：Al薄膜在薄膜太阳能电池中的应用
6. Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering [C] . M. Benegra, D.G. Lamas, M.E. Fernandez de Rapp, International Conference on Metallurgical Coatings and Thin Films . 2006

机译：通过直流和脉冲直流不平衡磁控溅射沉积的氮化钛薄膜中的残余应力
7. Pulsed DC reactive magnetron sputtering of aluminum nitride thin films. [D] . Cho, Jung Won. 2002

机译：脉冲直流反应磁控管溅射氮化铝薄膜。
8. High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency [O] . J Šícha, D Heřman, J Musil, 2007

机译：TiO2光催化薄膜的高速低温直流脉冲磁控溅射：重复频率的影响
9. Structural and Optical Properties of Aluminum Nitride Thin Films Deposited by Pulsed DC Magnetron Sputtering [O] . R. K. Choudhary, P. Mishra, A. Biswas, 2013

机译：脉冲DC磁控溅射沉积的氮化铝薄膜的结构和光学性质
10. Characterization of DC Magnetron Sputtering Systems for the Deposition of Tantalum Nitride, Titanium, and Palladium Thin Films for HMC (Hybrid Microcircuit) Applications. [R] . Snow, G. S. 1989

机译：用于HmC（混合微电路）应用的氮化钽，钛和钯薄膜沉积的DC磁控溅射系统的表征。

Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices

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