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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Inductive Effect of Nd for Ni3+ Stabilization in NdNiO3 Synthesized by Reactive DC Cosputtering
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Inductive Effect of Nd for Ni3+ Stabilization in NdNiO3 Synthesized by Reactive DC Cosputtering

机译：Nd在反应性直流舒加性合成Ni3 +稳定下Nd的诱导效应

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摘要

This work focus on the oxidation states of nickel in NdNiO3, Nd2NiO4, and NiOx thin films deposited by reactive magnetron sputtering. Thin films with a high Ni3+ content have been reached in the ternary oxides using a soft subsequent annealing in air. In order to understand the presence of Ni3+ oxidation state, the present work establishes a comparative study between the NiOx and Nd-Ni-O-x thin films deposited at room temperature in reactive conditions using different oxygen partial pressures. Crystallographic phases have been systematically identified by X-ray diffraction showing crystallized NiOx and amorphous thin films in the case of Ni and Nd cosputtering. The ionization state of Ni ions has been tracked by X-ray photoelectron spectroscopy. Analyses confirm the presence of Ni2+ in NiOx films whereas Ni3+ is systematically observed in Nd-Ni-O-x films highlighting the key role of Nd element during the deposition. The electron donor character of Nd3+ on Ni3+ via O 2p states-by an inductive effect is clearly evidenced. This effect is strengthened by a strong difference in electronegativity between the rare earth (Re) and the transition metal (M). This concept is enlarged and faced with other ReMO3 perovskites, and their thermodynamic stability is discussed.
机译：这项工作侧重于由反应磁控溅射沉积的NdNiO3，Nd2NiO 4和NiOx薄膜中镍的氧化状态。使用空气中的软退火已经在三元氧化物中达到具有高Ni3 +含量的薄膜。为了理解Ni3 +氧化状态的存在，本作者在使用不同氧气部分压力的反应条件下沉积在室温下的NiOx和Nd-Ni-O-X薄膜之间的比较研究。通过X射线衍射系统地系统地鉴定了结晶阶段，所述X射线衍射显示在Ni和Nd植物的情况下结晶的NiOx和无定形薄膜。通过X射线光电子能谱跟踪Ni离子的电离状态。分析证实Ni 2 +在NiOx膜中存在Ni2 +，而Ni3 +在Nd-Ni-O-x膜中被系统地观察到ND元素在沉积期间的关键作用。通过O 2P状态的ND3 +上的电子给体特性，通过诱导效果。通过稀土（RE）和过渡金属（M）之间的电负性强烈差异加强这种效果。该概念被扩大并面对其他Remo3 Perovskites，并讨论了它们的热力学稳定性。

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    Boileau A.; Capon F.; Coustel R.; Laffez P.; Barrat S.; Pierson J. F.;

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    Univ Lorraine CNRS UMR 7198 Inst Jean Lamour 2 Allee Andre Guinier Campus Artem F-54000 Nancy France;

    Univ Lorraine CNRS UMR 7198 Inst Jean Lamour 2 Allee Andre Guinier Campus Artem F-54000 Nancy France;

    Univ Lorraine CNRS UMR 7564 Lab Chim Phys &

    Microbiol Environm 405 Rue Vandoeuvre F-54600 Villers Les Nancy France;

    Univ Francois Rabelais Tours CNRS UMR 7347 GREMAN IUT Blois 15 Rue Chocolaterie F-41000 Blois France;

    Univ Lorraine CNRS UMR 7198 Inst Jean Lamour 2 Allee Andre Guinier Campus Artem F-54000 Nancy France;

    Univ Lorraine CNRS UMR 7198 Inst Jean Lamour 2 Allee Andre Guinier Campus Artem F-54000 Nancy France;

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  • 正文语种 eng
  • 中图分类 物理化学（理论化学）、化学物理学;
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