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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >The effect of thickness and annealing treatment on microstructure and magnetic properties of amorphous Fe-Si-B-P-C thin films
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The effect of thickness and annealing treatment on microstructure and magnetic properties of amorphous Fe-Si-B-P-C thin films

机译：厚度和退火处理对无定形Fe-Si-B-P-C薄膜微观结构和磁性的影响

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摘要

To develop an excellent low-dimensional magnetic material, the evolution of microstructure and soft magnetic properties in thin films with thickness as well as annealing treatment has been systematically investigated. Fe-Si-B-P-C thin films were fabricated using radio frequency magnetron sputtering. Microstructure of as-deposited and as-annealed thin films with various thicknesses have been characterized, and corresponding soft magnetic properties have been studied. The magnetic domain structure in thin films was further characterized via the magneto-optical Kerr microscope. It is revealed that all these as-deposited thin films exhibit a columnar structure, and the surface roughening is in accordance with the anomalous scaling. The coercivity gradually decreases from 4.8 Oe for 61 nm-thick film to 0.6 Oe for 608 nm-thick film, and almost remains constant with further increasing thickness, while the magnetic impedance ratio rises with thickness. After 473 K-annealing treatment coercivity decreases and magnetic impedance ratio increases, which can be attributed to the release of residual stress and the enhanced exchange coupling. After annealing at 573 K, although no obvious improvement in coercivity occurs, magnetic impedance ratio further rises due to the enhanced electrical conductivity and the reduced magnetic anisotropy. Severe crystallization takes place after annealed at 673 K, deteriorating soft magnetic properties of thin films. Therefore, the 573 K-annealed Fe-Si-B-P-C thin film with 1210 nm in thickness exhibits the best soft magnetic properties, having coercivity of 0.3 Oe, magnetic impedance ratio of 66.2% and relatively low magnetic anisotropy, which is a very promising soft magnetic material for sensor application.
机译：为了开发出优异的低磁性材料，系统地研究了具有厚度的薄膜和退火处理的微观结构和软磁特性的演变。使用射频磁控溅射制造Fe-Si-B-P-C薄膜。已经考虑了具有各种厚度的沉积和退火的薄膜的微观结构，并且已经研究了相应的软磁特性。薄膜中的磁畴结构进一步通过磁光kerr显微镜表征。据透露，所有这些沉积的薄膜表现出柱状结构，表面粗糙化符合异常缩放。矫顽力从4.8℃逐渐降低到61nm厚的薄膜至0.6°O厚的薄膜，并且几乎保持恒定的厚度，而磁阻抗比厚度升高。在473 k退火处理矫顽力下降之后，磁阻抗比增加，这可以归因于释放残余应力和增强的交换耦合。在573 k下退火后，尽管发生矫顽力没有明显改善，但由于增强的导电性和降低的磁各向异性，磁阻抗比进一步上升。在673k下退火后发生重度结晶，薄膜的软磁特性劣化。因此，具有1210nm的573 k退火的Fe-Si-BPC薄膜厚度具有最佳的软磁性，具有0.3 OE的矫顽力，磁阻比为66.2％和相对低的磁各向异性，这是一个非常有前途的柔软用于传感器应用的磁性材料。

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