...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Defect prevention in silica thin films synthesized using AP-PECVD for flexible electronic encapsulation
【24h】

Defect prevention in silica thin films synthesized using AP-PECVD for flexible electronic encapsulation

机译：使用AP-PECVD为灵活的电子封装合成的二氧化硅薄膜缺陷预防

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Industrially and commercially relevant roll-to-roll atmospheric pressure-plasma enhanced chemical vapour deposition was used to synthesize smooth, 80 nm silica-like bilayer thin films comprising a dense 'barrier layer' and comparatively porous 'buffer layer' onto a flexible polyethylene 2,6 naphthalate substrate. For both layers, tetraethyl orthosilicate was used as the precursor gas, together with a mixture of nitrogen, oxygen and argon. The bilayer films demonstrated exceptionally low effective water vapour transmission rates in the region of 6.1 x 10(-4) g m(-2) d(-1) (at 40 degrees C, 90% relative humidity), thus capable of protecting flexible photovoltaics and thin film transistors from degradation caused by oxygen and water. The presence of the buffer layer within the bilayer architecture was mandatory in order to achieve the excellent encapsulation performance. Atomic force microscopy in addition to solvent permeation measurements, confirmed that the buffer layer prevented the formation of performance-limiting defects in the bilayer thin films, which likely occur as a result of excessive plasma-surface interactions during the deposition process. It emerged that the primary function of the buffer layer was therefore to act as a protective coating for the flexible polymer substrate material.
机译：工业上和商业相关的卷滚常态压力 - 等离子体增强的化学气相沉积用于合成光滑的80nm二氧化硅状双层薄膜，其包含致密的“阻挡层”和相对多孔的“缓冲层”在柔性聚乙烯2上，6个萘甲酸酯基质。对于这两层，用氮气，氧气和氩气的混合物用作前体气体作为前体气体的四乙酯。双层薄膜在6.1×10（-4）GM（-2）D（-1）（-1）（40℃，90％相对湿度）的区域中表现出具有极低的有效水蒸气透射率，因此能够保护柔性光伏和薄膜晶体管免于氧气和水引起的劣化。在双层架构内的缓冲层的存在是强制性的，以实现优异的封装性能。原子力显微镜除了溶剂渗透测量之外，确认缓冲层防止了在双层薄膜中形成了性能限制缺陷，这可能由于沉积过程中的过度等离子体表面相互作用而发生。它揭示了缓冲层的主要功能，因此是用作柔性聚合物基材材料的保护涂层。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号