Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017)

Ono Kouichi; Nakazaki Nobuya; Tsuda Hirotaka; Takao Yoshinori; Eriguchi Koji

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Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017)

机译：硅等离子蚀刻过程中的表面形态演化：粗糙化，平滑和纹波形成（Vol 50,414001,2017）

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《Journal of Physics, D. Applied Physics: A Europhysics Journal》 |2017年第46期|共1页
作者
Ono Kouichi; Nakazaki Nobuya; Tsuda Hirotaka; Takao Yoshinori; Eriguchi Koji;
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作者单位

Kyoto Univ Grad Sch Engn Dept Aeronaut &

Astronaut Nishikyo Ku Kyoto 6158540 Japan;

Kyoto Univ Grad Sch Engn Dept Aeronaut &

Astronaut Nishikyo Ku Kyoto 6158540 Japan;

Kyoto Univ Grad Sch Engn Dept Aeronaut &

Astronaut Nishikyo Ku Kyoto 6158540 Japan;

Kyoto Univ Grad Sch Engn Dept Aeronaut &

Astronaut Nishikyo Ku Kyoto 6158540 Japan;

Kyoto Univ Grad Sch Engn Dept Aeronaut &

Astronaut Nishikyo Ku Kyoto 6158540 Japan;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
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1. Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017) [J] . Ono Kouichi, Nakazaki Nobuya, Tsuda Hirotaka, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2017,第46期

机译：硅等离子蚀刻过程中的表面形态演化：粗糙化，平滑和纹波形成（Vol 50,414001,2017）
2. Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation [J] . Ono Kouichi, Nakazaki Nobuya, Tsuda Hirotaka, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2017,第41期

机译：硅等离子体蚀刻过程中的表面形态演化：粗糙化，平滑和纹波形成
3. Origin of plasma-induced surface roughening and ripple formation during plasma etching: The crucial role of ion reflection [J] . Hatsuse Takumi, Nakazaki Nobuya, Tsuda Hirotaka, Journal of Applied Physics . 2018,第14期

机译：等离子刻蚀过程中等离子引起的表面粗糙和波纹形成的起源：离子反射的关键作用
4. Comparison using surface evolution theory of the smoothing and figuring of optics by plasma-assisted chemical etching and ion milling [C] . Charles B. Zarowin Conference on large optics . 1992

机译：等离子体辅助化学蚀刻和离子铣削使用表面演化理论使用表面演化理论的比较
5. Halogen-induced modification of silicon surfaces: Etching roughening, and step transformations. [D] . Butera, Robert E. 2010

机译：卤素诱导的硅表面改性：蚀刻粗糙化和阶跃转变。
6. Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal-Assisted Chemical Etching [O] . Lester U. Vinzons, Lei Shu, SenPo Yip, 2017

机译：揭示金属辅助化学刻蚀过程中多孔硅纳米线的形态演变和刻蚀动力学
7. Halogen-induced modification of silicon surfaces: etching roughening, and step transformations [O] . Butera Robert E. 2010

机译：卤素诱导的硅表面改性：蚀刻粗糙化和阶梯转换

Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017)

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