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首页> 外文期刊>Crystal growth & design >Design and Growth of Deep UV-Range Single Crystalline ZnMgAlO Thin Films Lattice-Matched to ZnO
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Design and Growth of Deep UV-Range Single Crystalline ZnMgAlO Thin Films Lattice-Matched to ZnO

机译：ZnO匹配的深紫外范围单晶ZnMgAlO薄膜的设计与生长

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Quaternary ZnMgAlO films lattice matched to a ZnO wafer were designed, grown, and characterized in detail. It was observed that the Zn_(1?x?y)Mg_xAl_yO films are lattice matched to the ZnO substrates when grown with a x/y ratio of ～2.8, as predicted based upon the Vegard’s rule. Cathodoluminescence spectra of the films revealed a near-band emission peak at 4.13 eV for the Zn_(0.78)Mg_(0.16)Al_(0.06)O/ZnO film and 3.71 eV for the Zn0.91Mg0.07Al0.02O/ZnO film, which is also consistent with the results of the calculation. It is believed that the ZnMgAlO films, with single crystalline nature and smooth surfaces (average surface roughness of about 0.9 nm), would be a very promising material system for the high quality deep-UV optoelectronic devices.
机译：详细设计，生长和表征了与ZnO晶片晶格匹配的第四级ZnMgAlO薄膜。可以观察到，根据Vegard法则，当Zn_（1？x？y）Mg_xAl_yO薄膜以x / y比为2.8的比例生长时，它们与ZnO衬底晶格匹配。膜的阴极发光光谱显示，Zn_（0.78）Mg_（0.16）Al_（0.06）O / ZnO膜在4.13 eV处有一个近波段发射峰，而Zn0.91Mg0.07Al0.02O / ZnO膜在3.71 eV附近有一个发射峰。也与计算结果一致。可以相信，具有单晶性质和光滑表面（平均表面粗糙度约为0.9 nm）的ZnMgAlO膜将是高质量深紫外光电器件的非常有前途的材料系统。

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