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首页> 外文期刊>Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada >Liftout of High-Quality Thin Sections of a Perovskite Oxide Thin Film Using a Xenon Plasma Focused Ion Beam Microscope
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Liftout of High-Quality Thin Sections of a Perovskite Oxide Thin Film Using a Xenon Plasma Focused Ion Beam Microscope

机译：使用氙等离子聚焦离子束显微镜抬起钙钛矿氧化物薄膜的高质量薄膜

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It is shown that a xenon plasma focused ion beam (FIB) microscope is an excellent tool for high-quality preparation of functional oxide thin films for atomic resolution electron microscopy. Samples may be prepared rapidly, at least as fast as those prepared using conventional gallium FIB. Moreover, the surface quality after 2 kV final polishing with the Xe beam is exceptional with only about 3 nm of amorphized surface present. The sample quality was of a suitably high quality to allow atomic resolution high-angle annular dark field imaging and integrated differential phase contrast without any further preparation, and the resulting images were good enough for quantitative evaluation of atomic positions to reveal the oxygen octahedral tilt pattern. This suggests that such xenon plasma FIB instruments may find widespread application in transmission electron microscope and scanning transmission electron microscope specimen preparation.
机译：结果表明，氙血浆聚焦离子束（FIB）显微镜是用于原子分辨电子显微镜的功能氧化物薄膜的高质量制备的优异工具。 样品可以快速制备，至少与使用常规镓FIB制备的那些一样快。 此外，与XE梁2kV最终抛光后的表面质量尤其具有约3nm的无体化表面。 样品质量是一种适当的高质量，以允许原子分辨率高角度环形暗场成像和集成差异相位对比度而没有任何进一步的制备，并且所得到的图像足以用于定量评估原子位置，以揭示氧气八面体倾斜图案的原子位置 。 这表明这种氙血浆FIB仪器可以在透射电子显微镜和扫描透射电子显微镜样品制备中找到广泛应用。

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