Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

Correia F. C.; Salvador P. B.; Ribeiro J. M.; Mendes A.; Tavares C. J.

首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

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Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

机译：对ZnO和ZnO：Ga和ZnO：Al薄膜的影响对ZnO和ZnO：Al薄膜的影响（Vol152，PG 252,2018）

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《Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology》 |2018年第2018期|共1页
作者
Correia F. C.; Salvador P. B.; Ribeiro J. M.; Mendes A.; Tavares C. J.;
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Univ Minho Ctr Phys P-4804533 Guimaraes Portugal;

Univ Minho Ctr Phys P-4804533 Guimaraes Portugal;

Univ Minho Ctr Phys P-4804533 Guimaraes Portugal;

Univ Porto Fac Engn LEPABE Rua Roberto Frias S-N P-4200465 Porto Portugal;

Univ Minho Ctr Phys P-4804533 Guimaraes Portugal;

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中图分类真空技术;真空技术的应用;
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1. Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018) [J] . Correia F. C., Salvador P. B., Ribeiro J. M., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2018,第期

机译：对ZnO和ZnO：Ga和ZnO：Al薄膜的影响对ZnO和ZnO：Al薄膜的影响（Vol152，PG 252,2018）
2. Influence of thickness on the structural, optical and electrical properties of Ga-doped ZnO thin films deposited by sputtering magnetron (vol 695, pg 697, 2017) [J] . Mahdhi H., Alaya S., Gauffier J. L., Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2018,第期

机译：厚度对溅射磁控沉积的Ga掺杂ZnO薄膜结构，光学和电性能的影响（Vol 695，PG 697,2017）
3. Optical and Electrical Properties of the Different Magnetron Sputter Power 300℃ Deposited Ga_2O_3-ZnO Thin Films and Applications in p-i-n α-Si:H Thin-Film Solar Cells [J] . Fang-Hsing Wang, Chia-Cheng Huang, Cheng-Fu Yang, International Journal of Photoenergy . 2013,第Pta1期

机译：不同磁控溅射功率300℃沉积Ga_2O_3-ZnO薄膜的光电性能及其在p-i-nα-Si：H薄膜太阳能电池中的应用
4. Effect of rf power on structural, optical and morphological properties of ultrathin undoped ZnO films deposited by rf magnetron sputtering [C] . Kumar J.Vinoth, Maldonado A., Matsumoto Y., International Conference on Electrical Engineering, Computing Science and Automatic Control . 2014

机译：射频功率对射频磁控溅射沉积超薄未掺杂ZnO薄膜的结构，光学和形貌特性的影响
5. Manufacturing gallium doped ZNO thin films suitable for use in thin film transistors using unbalanced magnetron sputtering. [D] . Jones, Timothy R. 2013

机译：使用不平衡磁控溅射制造适用于薄膜晶体管的掺镓ZNO薄膜。
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

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7. Morphological and electrical evolution of ZnO:Al thin films deposited by rf magnetron sputtering onto glass substrates [O] . Silva, Erica Pereira da [UNESP], Chaves, Michel [UNESP], Durrant, Steven Frederick [UNESP], 2014

机译：射频磁控溅射沉积在玻璃基板上的ZnO：Al薄膜的形貌和电演化

Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

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