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首页> 外文期刊>ACS Macro Letters >High-Resolution Nanopatterning of Free-Standing, Self-Supported Helical Polypeptide Rod Brushes via Electron Beam Lithography
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High-Resolution Nanopatterning of Free-Standing, Self-Supported Helical Polypeptide Rod Brushes via Electron Beam Lithography

机译：通过电子束光刻的独立式自支撑螺旋多肽杆刷的高分辨率纳米仪

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摘要

In this study of nanopatterned helical poly(benzyl-L-glutamate) (PBLG) brushes, rod-type brush arrays were fabricated via an integrated process of high-resolution lithography and surface-initiated vapor deposition polymerization (SI-VDP). "Nanospikes" of polymer brushes with spacings of less than 100 nm were produced. The topology and areal behavior of the resulting patterned rod-like brushes were analyzed and compared with patterned coil-type brushes. A geometric study of these self-assembled "nanospikes" was carried out, and their cross sections were investigated via focused ion beam (FIB) and scanning electron microscopy (SEM). Furthermore, the presence of poly(N-isopropylacrylamide) (PNIPAM) brushes in unpatterned regions was shown to inhibit undesired "inter-spike" bridging of the PBLG brushes, resulting in more well-defined nanostructures. It was shown that rod-like polypeptide brushes are capable of self-segregation and become arranged vertically without any external support from their surroundings, to form a rod bundle end-point functional topography that could provide possible pathways for studies of model biological surfaces, directed assembly of nanoparticles, or binary mixed brush surfaces with dual properties.
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  • 来源
    《ACS Macro Letters》 |2021年第6期|共5页
  • 作者

    Huang Yuming; Tran Hai; Ober Christopher K.;

  • 作者单位

    Cornell Univ Dept Mat Sci &

    Engn Ithaca NY 14853 USA;

    Cornell Univ Robert F Smith Sch Chem &

    Biomol Engn Ithaca NY 14853 USA;

    Cornell Univ Dept Mat Sci &

    Engn Ithaca NY 14853 USA;

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  • 正文语种 eng
  • 中图分类 有机化学;
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