MEASURING AND MODELING THE PROXIMITY EFFECT IN DIRECT-WRITE ELECTRON-BEAM LITHOGRAPHY KINOFORMS

Nikolajeff F.; Larsson M.; Ekberg M.; Hard S.; Bengtsson J.

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MEASURING AND MODELING THE PROXIMITY EFFECT IN DIRECT-WRITE ELECTRON-BEAM LITHOGRAPHY KINOFORMS

机译：直接写电子束平版印刷人形的近似效果的测量和建模

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The proximity effect in successively developed direct-write electron-beam lithography gratings is measured. The grating relief shapes are obtained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a double Gaussian point-spread function, we determine the parameters of the point-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less. [References: 4]

机译：测量了相继开发的直接写入电子束光刻光栅中的邻近效应。光栅起伏形状是从几个光栅衍射级的测量功率中获得的。通过使用双高斯点扩展函数进行卷积来描述邻近效应，我们确定了点扩展函数的参数。发现点扩展函数的编写部分随开发时间的增加而显着增加，而背景部分则少得多。 [参考：4]

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《Applied optics》 |1995年第5期|共7页
作者
Nikolajeff F.; Larsson M.; Ekberg M.; Hard S.; Bengtsson J.;
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正文语种 eng
中图分类光学;
关键词
Proximity effect; Direct-write electron-beam lithography; Successive development; Kinoform;

机译：邻近效应;直写电子束光刻;成功开发;Kinoform;

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专利

1. MEASURING AND MODELING THE PROXIMITY EFFECT IN DIRECT-WRITE ELECTRON-BEAM LITHOGRAPHY KINOFORMS [J] . Nikolajeff F., Larsson M., Ekberg M., Applied optics . 1995,第5期

机译：直接写电子束平版印刷人形的近似效果的测量和建模
2. Direct-write electron-beam lithography of an IR antenna-coupled microbolometer onto the surface of a hemispherical lens [J] . Middlebrook CT, Zummo G, Boreman GD Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2006,第6期

机译：红外天线耦合测微仪的直接写入电子束光刻在半球形透镜表面上
3. Compparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies [J] . Irina Puscasu, G.Boreman, R.C.Tiberio Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena . 2000,第6期

机译：通过直接写入电子束和双层纳米压印光刻技术制造的红外频率选择表面的比较
4. Application of an electron-beam scattering parameter extraction method for proximity correction in direct-write electron-beam lithography [C] . Author(s): Rudolf M. Weiss Etec Systems Inc. Hayward CA USA, Robert M. Sills Etec Systems Inc. Hayward CA USA. Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing . 1991

机译：电子束散射参数提取方法在直写式电子束光刻中的邻近校正中的应用
5. Thin-film gated photocathodes for multiple-beam electron-beam lithography. [D] . Pei, Zeting. 2001

机译：用于多束电子束光刻的薄膜栅极光阴极。
6. Direct-Write Maskless Lithography of LBL Nanocomposite Films and its Prospects for MEMS Technologies [O] . Yongxiao Bai, Szushen Ho, Nicholas A. Kotov -1

机译：LBL纳米复合薄膜的直接写入无掩模光刻及其对MEMS技术的前景
7. Lossless Layout Image Compression Algorithms for Electron-Beam Direct-Write Lithography [O] . Chaudhary, Narendra, Luo, Yao, Savari, Serap A., 2015

机译：电子束无损布局图像压缩算法直写光刻

MEASURING AND MODELING THE PROXIMITY EFFECT IN DIRECT-WRITE ELECTRON-BEAM LITHOGRAPHY KINOFORMS

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