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Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering

机译：离子束溅射沉积Nb2O5薄膜的内应力和光学性质

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The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, V-b. The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to V-b, and a high compressive stress of -0.467 GPa was measured at V-b = 850 V. The Nb2O5-SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film. (C) 2002 Optical Society of America. [References: 17]
机译：研究了离子束能量对Nb2O5薄膜内部应力和光学性能的影响。 Nb2O5薄膜通过离子束溅射以不同的离子束电压V-b沉积在未加热的玻璃基板上。发现折射率，消光系数和表面粗糙度取决于离子束能量。薄膜中的应力是通过相移干涉技术测量的。还发现薄膜应力与V-b有关，在V-b = 850 V时测得的压缩应力为-0.467 GPa。与单层Nb2O5薄膜相比，Nb2O5-SiO2多层涂层的平均压缩应力较小。 （C）2002年美国眼镜学会。 [参考：17]

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