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Electrical contact performance of MEMS acceleration switch fabricated by UV-LIGA technology

机译:采用UV-LIGA技术制造的MEMS加速开关的电接触性能

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摘要

This paper expanded a micro-contact resistance model to investigate the contact performance for a acceleration switch fabricated by UV-LIGA (Ultra-violet Lithographie, Galvanoformung and Abformung) technology. Based on the relationship between the contact radius a and electron mean free path lambda, three different contact resistance models have been analyzed. The material properties (elastic modulus E, hardness H and Poisson's ratio nu) and surface topographic parameters (asperity summit radius r, standard deviation of height distribution sigma, and surface density of asperity) have been studied to evaluate the contact resistance-load characteristics. The results show that the theoretical prediction of contact resistance-load characteristics correlates well with the experimental results except there exists experimental discrepancy. The discrepancy between theoretical predictions and experimental results mainly is due to the contaminations, errors from assumptions, surface oxidation and external environmental conditions.
机译:本文扩展了一个微接触电阻模型,以研究通过UV-LIGA(紫外光刻,Galvanoformung和Abformung)技术制造的加速开关的接触性能。基于接触半径α和电子平均自由程λ之间的关系,分析了三种不同的接触电阻模型。研究了材料性能(弹性模量E,硬度H和泊松比nu)和表面形貌参数(粗糙峰顶半径r,高度分布sigma的标准偏差和粗糙表面的密度),以评估接触电阻-载荷特性。结果表明,除了存在实验差异外,接触电阻-负载特性的理论预测与实验结果吻合良好。理论预测与实验结果之间的差异主要是由于污染,假设误差,表面氧化和外部环境条件造成的。

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