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Simple, low-cost technique for photolithographic self-aligned top metal contacts to nanowires and nanotubes

机译:简单,低成本的技术,用于光刻自对准顶部金属与纳米线和纳米管的接触

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摘要

We propose a new simple, low-cost method for providing all-round metal contacts to one-dimensional structures such as carbon nanotubes and nanowires on a transparent substrate. The nanostructures are first positioned in place to bridge a electrode gap by dielectrophoresis. The electrode structure is then used as a self-aligned mask during the subsequent photolithography through illumination from the substrate backside. This is followed by metallization and lift-off. Our measurements on multi-walled carbon nanotubes thus contacted show reasonable yield and good electrical contacts for the process carried out on a glass slide as the substrate.
机译:我们提出了一种新的简单,低成本的方法,用于在透明基板上为诸如碳纳米管和纳米线等一维结构提供全方位的金属接触。首先将纳米结构放置在适当的位置,以通过介电电泳弥合电极间隙。然后在随后的光刻过程中,通过从基板背面进行照射,将电极结构用作自对准掩模。接下来是金属化和剥离。我们对这样接触的多壁碳纳米管的测量显示出合理的产率和良好的电接触,适合在以载玻片为基材的过程中进行。

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