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Atomic force microscopy lithography as a nanodevice development technique

机译：原子力显微镜平版印刷术作为一种纳米器件开发技术

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Nanoscale science and technology is today mainlyfocused on the fabrucation of nanodevices. Our approach makesuse of lithography processes to build the desired nanostructuresdirectly. The fabrication process involves an electron-beamlithography technique to define metallic microstructures ontowhich nanometer scale patterning is performed using an atomicforce microscope (AFM) as a mechanical modification tool. Bothdirect material removal and AFM-assisted mask patterning areapplied in order to achieve the smallest possible separationbetween electrode pairs. The sample preparation involves apolymer deposition process that results in conformal growth andin surface roughness comparable to that of the substrate. Theresults of the application of this technique show that the processis reproducible and exhibits a good operation control during thelithographic steps, both ensured by the imaging facilities of theAFM. The nanolithography technique has been used to fabricatenanogap electrodes to be used for molecular devices. The studyreported here can be considered as a relizble starting point for thedevelopment of more complex nanodevices, such as single-electron transistors.
机译：如今，纳米级科学技术主要集中在纳米器件的制造上。我们的方法利用光刻工艺直接构建所需的纳米结构。该制造过程涉及电子束光刻技术，以定义金属微结构，使用原子力显微镜（AFM）作为机械修改工具在其上进行纳米级图案化。直接材料去除和AFM辅助掩模图案化都可以应用，以实现电极对之间的最小间距。样品制备涉及聚合物沉积过程，该过程导致保形生长和表面粗糙度与基材相当。该技术的应用结果表明，该过程是可重复的，并且在光刻步骤期间显示出良好的操作控制，这两者均由AFM的成像设备确保。纳米光刻技术已被用于制造用于分子器件的纳米间隙电极。此处报告的研究可被视为开发更复杂的纳米器件（如单电子晶体管）的可靠起点。

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