Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

Harry J Whitlow; May Ling Ng; Vaida Auzelyte

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Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

机译：通过MeV质子束写入以最小的邻近效应对间距小于100 nm的高空间密度生物传感器结构进行光刻

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Metal electrode structures for biosensors with a high spatial density and approx 85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (approx 100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.

机译：使用聚甲基丙烯酸甲酯正性抗蚀剂的聚焦兆电子伏（MeV）质子束写入结合金属剥离技术，已经生产出具有高空间密度和约85 nm间隙的生物传感器金属电极结构。用于聚焦MeV质子束写入的（约100 nm）抗蚀剂层中的最小接近曝光和直质子轨迹强烈表明，最终电极间隙宽度可以达到几纳米。

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《Nanotechnology》 |2004年第1期|共4页
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Harry J Whitlow; May Ling Ng; Vaida Auzelyte;
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1. Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect [J] . Harry J Whitlow, May Ling Ng, Vaida Auzelyte Nanotechnology . 2004,第1期

机译：通过MeV质子束写入以最小的邻近效应对间距小于100 nm的高空间密度生物传感器结构进行光刻
2. Fabrication of sub-100 nm patterns in SiO2 templates by electron-beam lithography for the growth of periodic III-V semiconductor nanostructures [J] . Chen A, Chua SJ, Chen P, Nanotechnology . 2006,第15期

机译：利用电子束光刻技术在SiO2模板中制备亚100 nm图案，以生长周期性的III-V半导体纳米结构
3. Programmable proximity aperture lithography with MeV ion beams [J] . Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第5期

机译：带有MeV离子束的可编程接近孔径光刻
4. Periodic sub-100 nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning) [C] . Yannick Bourgin, Daniel Voigt, Thomas Kaesebier, Optical microlithography XXIX . 2016

机译：通过邻近i线掩模对准器光刻（和自对准双图案化）制造的周期性100 nm以下结构
5. Fabrication of annular nanostructures using ion beam proximity lithography. [D] . Ruiz, Ariel. 2008

机译：使用离子束近距离光刻技术制造环形纳米结构。
6. Protein structure alignment beyond spatial proximity [O] . Sheng Wang, Jianzhu Ma, Jian Peng, -1

机译：蛋白质结构比对超出空间范围
7. Optimization and Computer Control of the Sub-100 nm, Proton Beam Writing Facility at CIBA [O] . CHAMMIKA N B UDALAGAMA 2006

机译：CIBA的100 nm以下质子束写入设备的优化和计算机控制

Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

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