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Lithographic pattern formation via metastable state rare gas atomic beams

机译：通过亚稳态稀有气体原子束形成光刻图案

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Atomic beams of argon and neon in excited electronic metastable states have been used to pattern bare and dodecanethiol (DDT) resist coated Au/Si substrates. Positive and negative contrast patterning has been observed for DDT-Au/Si, and negative patterning has been observed for bare Au/Si. Our results provide evidence for the formation of these negative patterns resulting from significant background pump oil contamination, and at significantly lower metastable dosages than previously observed. X-ray photoelectron spectroscopy (XPS) results indicate the growth of a carbonaceous layer as the origin of the negative resists in DDT-Au/Si and bare Au/Si substrates. For DDT-Au/Si, results indicate that the transition from positive to negative resist formation relies both on the metastable dosages and level of background pump oil contamination.
机译：处于激发电子亚稳态的氩和氖原子束已用于对裸露的和十二烷硫醇（DDT）抗蚀剂涂覆的Au / Si基板进行构图。对于DDT-Au / Si，已经观察到正反图案;对于裸金/ Si，已经观察到负图案。我们的结果提供了证据，证明了由明显的背景泵油污染导致的这些负性图形的形成，并且其亚稳态剂量明显低于以前观察到的剂量。 X射线光电子能谱（XPS）结果表明，碳层的生长是DDT-Au / Si和裸Au / Si衬底中负性抗蚀剂的起源。对于DDT-Au / Si，结果表明从正抗蚀剂形成到负抗蚀剂形成的过渡既依赖于亚稳定剂量，也依赖于背景泵油污染的水平。

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