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New process for high optical quality InAs quantum dots grown on patterned GaAs(00l) substrates

机译:在图案化的GaAs(00l)衬底上生长的高质量光学InAs量子点的新工艺

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This work presents a selective ultraviolet (UV)-ozone oxidation-chemical etching process that has been used, in combination with laser interference lithography (LIL), for the preparation of GaAs patterned substrates. Further molecular beam epitaxy (MBE) growth of InAs results in ordered InAs/GaAs quantum dot (QD) arrays with high optical quality from the first layer of QDs formed on the patterned substrate. The main result is the development of a patterning technology that allows the engineering of customized geometrical displays of QDs with the same optical quality as those formed spontaneously on flat non-patterned substrates.
机译:这项工作提出了一种选择性的紫外线(UV)-臭氧氧化-化学蚀刻工艺,该工艺已与激光干涉光刻(LIL)结合用于制备GaAs图案化衬底。 InAs的进一步分子束外延(MBE)生长导致形成在图案化基板上的第一层QD形成具有高光学质量的有序InAs / GaAs量子点(QD)阵列。主要结果是构图技术的发展,该技术允许对QD的定制几何显示进行工程设计,其光学质量与自发形成在平坦的非构图基板上的光学质量相同。

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