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首页> 外文期刊>Laser Physics: An International Journal devoted to Theoretical and Experimental Laser Research and Application >Simulation and fabrication of nanostructures with laser interference lithography
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Simulation and fabrication of nanostructures with laser interference lithography

机译：激光干涉光刻技术模拟和制备纳米结构

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This article presents laser interference lithography, a preferred method to achieve periodic structures in a large area with fast speed and low cost. Simulations and experiments for two-beam interference lithography with single exposure and double exposure were expressed. In the experiments, patterns on photoresist were transferred to a silicon substrate by wet etching. The experimental results were consistent with the simulative results. The one-dimensional nanogrooves were obtained by single exposure, and different widths of nanogrooves during the same period were fabricated on silicon substrates by varying exposure time. In addition, two-dimensional grid patterns were obtained by double exposure. With the increasing of exposure time, the grid pattern changed from a nanoholes array to a nanodots array. The results showed that laser interference lithography is an efficient method to fabricate nanostructures with various geometrical parameters by controlling exposure time, which has a promising application in the study of nanotextured surface properties, such as wetting, adhesion and friction.
机译：本文介绍了激光干涉光刻技术，这是一种以大速度和低成本实现大面积周期结构的首选方法。给出了单曝光和双曝光两光束干涉光刻的仿真和实验。在实验中，通过湿蚀刻将光刻胶上的图案转移到硅衬底上。实验结果与模拟结果一致。通过单次曝光获得一维纳米沟槽，并通过改变曝光时间在硅衬底上制造相同时期的不同宽度的纳米沟槽。另外，通过两次曝光获得二维网格图案。随着曝光时间的增加，网格图案从纳米孔阵列变为纳米点阵列。结果表明，激光干涉光刻技术是一种通过控制曝光时间来制备具有各种几何参数的纳米结构的有效方法，在研究纳米结构化表面特性（如润湿性，粘附性和摩擦性）方面具有广阔的应用前景。

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