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Recent Progress on Critical Cleaning of Sapphire Single-Crystal Substrates: A Mini-Review

机译:蓝宝石单晶衬底临界清洗的最新进展:综述。

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摘要

Sapphire single-crystals are one of the industrial favorite substrates for GaN film deposition and LED application as well as a model system for oxides' aqueous interfacial chemistry studies. Contamination control of sapphire substrates is critical to the device fabrication and experimental studies of interfacial properties. Here we reviewed various methods reported in the literature including conventional and new wet-chemical methods, and UV/plasma methods. Special attentions were paid to their cleaning performance in terms of reliably removing organic/particulate/heavy metallic contaminants.
机译:蓝宝石单晶是用于GaN膜沉积和LED应用的工业最受欢迎的衬底之一,也是用于氧化物的水界面化学研究的模型系统。蓝宝石衬底的污染控制对于器件制造和界面特性的实验研究至关重要。在这里,我们回顾了文献中报道的各种方法,包括常规和新的湿化学方法以及UV /等离子方法。在可靠地去除有机/颗粒/重金属污染物方面,对其清洁性能给予了特别关注。

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