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首页> 外文期刊>RSC Advances >A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography
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A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography

机译：带有二茂铁基侧基有机金属官能团的杂化聚合物材料：使用EUV光刻的合成及其在纳米图案中的应用

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摘要

Largely because of their unique physical and chemical properties, the inclusion of ferrocene derivatives into polymer backbones has attracted great attention in materials research as these hybrid organometallic polymers find wide applications in various fields. Though chemically amplified photoresists (CARs) have become the workhorses for nanopatterning in semiconductor industries, due to several inherent problems CARs cannot be used for sub 20 nm technology and therefore non-chemically amplified resists (n-CARs) are gaining attention from the photoresists community, considering their potential in patterning sub 20 nm features with good line edge roughness/line width roughness (LER/LWR) and high resolution. Given that extreme ultraviolet lithography (EUVL) is approaching well towards the commercialization phase, the present work describes the development of novel solution processable EUV-sensitive hybrid organic-organometallic polymeric non-chemically amplified photoresist materials containing pendant ferrocene units and their applications in featuring 25 nm lines and complex nanopatterns using EUVL. This resist design is accomplished by copolymers that are prepared from monomers containing sulfonium groups which are sensitive to EUV irradiation. The copolymers were characterized by H-1 NMR and IR spectroscopic techniques, gel permeation chromatography as well as thermal analyses. Whereas the photon-directed polarity change at the sulfonium center followed by scission of the polymer backbone nullified the requirement for chemical amplification, the inclusion of organometallic species in the polymer microstructure into the polymer network improved the thermal stability of the resultant hybrid system.
机译：很大程度上由于它们独特的物理和化学性质，将二茂铁衍生物包含在聚合物主链中已引起材料研究的极大关注，因为这些杂化有机金属聚合物在各个领域都有广泛的应用。尽管化学放大的光刻胶（CAR）已成为半导体行业纳米图案化的主力军，但由于一些固有的问题，CAR无法用于20 nm以下的技术，因此非化学放大的光刻胶（n-CAR）引起了光刻胶界的关注，考虑到它们在图案化20 nm以下特征方面的潜力，具有良好的线边缘粗糙度/线宽粗糙度（LER / LWR）和高分辨率。鉴于极端紫外光刻（EUVL）接近商业化阶段，本工作描述了新型的可溶液加工的EUV敏感的，含有二茂铁单元的有机-有机金属杂化聚合物非化学放大的光致抗蚀剂材料及其在25纳米线和使用EUVL的复杂纳米图案。该抗蚀剂设计是通过由含有对EUV辐射敏感的sulf基的单体制备的共聚物完成的。通过H-1 NMR和IR光谱技术，凝胶渗透色谱以及热分析来表征共聚物。尽管在center中心进行的光子定向极性改变，然后切断聚合物主链使化学扩增的要求无效，但是在聚合物微结构中将有机金属物种包含到聚合物网络中改善了所得杂化体系的热稳定性。

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