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Acceptor states in heteroepitaxial CdHgTe films grown by molecular-beam epitaxy

机译:通过分子束外延生长的异质外延CdHgTe薄膜中的受体态

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摘要

The photoluminescence method is used to study acceptor states in CdHgTe heteroepitaxial films (HEFs) grown by molecular-beam epitaxy. A comparison of the photoluminescence spectra of HEFs grown on GaAs substrates (CdHgTe/GaAs) with the spectra of CdHgTe/Si HEFs demonstrates that acceptor states with energy depths of about 18 and 27 meV are specific to CdHgTe/GaAs HEFs. The possible nature of these states and its relation to the HEF synthesis conditions and, in particular, to the vacancy doping occurring under conditions of a mercury deficiency during the course of epitaxy and postgrowth processing are discussed.
机译:光致发光方法用于研究分子束外延生长的CdHgTe异质外延膜(HEF)中的受体状态。在GaAs衬底上生长的HEF的光致发光光谱(CdHgTe / GaAs)与CdHgTe / Si HEF的光谱比较表明,能量深度约为18和27 meV的受体态是CdHgTe / GaAs HEF特有的。讨论了这些状态的可能性质及其与HEF合成条件的关系,尤其是与在外延和生长后加工过程中在汞缺乏条件下发生的空位掺杂有关的问题。

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