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首页> 外文期刊>Particle & Particle Systems Characterization: Measurement and Description of Particle Properties and Behavior in Powders and Other Disperse Systems >Highly Pure and Luminescent Graphene Quantum Dots on Silicon Directly Grown by Chemical Vapor Deposition

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Highly Pure and Luminescent Graphene Quantum Dots on Silicon Directly Grown by Chemical Vapor Deposition

机译：化学气相沉积直接生长在硅上的高纯度和发光石墨烯量子点

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《Particle & Particle Systems Characterization: Measurement and Description of Particle Properties and Behavior in Powders and Other Disperse Systems》 |2016年第1期|共7页
作者
Huang Kun; Lu Wanglin; Yu Xuegong; Jin Chuanhong; Yang Deren;
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正文语种 eng
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1. Highly Pure and Luminescent Graphene Quantum Dots on Silicon Directly Grown by Chemical Vapor Deposition [J] . Huang Kun, Lu Wanglin, Yu Xuegong, Particle & Particle Systems Characterization: Measurement and Description of Particle Properties and Behavior in Powders and Other Disperse Systems . 2016,第1期

机译：化学气相沉积直接生长在硅上的高纯度和发光石墨烯量子点
2. 1.3 μm InAs/GaAs quantum dots directly capped with GaAs grown by metal-organic chemical vapor deposition [J] . Kun-Fu Huang, Tung-Po Hsieh, Nien-Tze Yeh, Journal of Crystal Growth . 2004,第1a3期

机译：1.3μmInAs / GaAs量子点直接被金属有机化学气相沉积生长的GaAs覆盖
3. 1.31 μm InGaAs quantum dot light-emitting diodes grown directly in a GaAs matrix by metalorganic chemical-vapor deposition [J] . M. T. Todaro, M. De Giorgi, V. Tasco, Applied Physics Letters . 2004,第14期

机译：通过金属有机化学气相沉积法直接在GaAs基质中生长的1.31μmInGaAs量子点发光二极管
4. 1.3 μm InAs/GaAs Quantum Dots Directly Capped With GaAs Grown By Metal Organic Chemical Vapor Deposition [C] . K.-F. Huang, T.-P. Hsieh, N.-T. Yeh, Materials Research Society Symposium . 2003

机译：1.3μminas / gaas量子点直接用金属有机化学气相沉积的GaAs
5. Metal-oxide-semiconductor devices based on epitaxial germanium layers grown selectively directly on silicon substrates by ultra-high-vacuum chemical vapor deposition [D] . Donnelly, Joseph Patrick 2009

机译：基于外延锗层的金属氧化物半导体器件，通过超高真空化学气相沉积直接在硅衬底上选择性生长
6. Raman enhancement on ultra-clean graphene quantum dots produced by quasi-equilibrium plasma-enhanced chemical vapor deposition [O] . Donghua Liu, Xiaosong Chen, Yibin Hu, -1

机译：准平衡等离子体增强化学气相沉积产生的超清洁石墨烯量子点的拉曼增强
7. Large-area uniform graphene-like thin films grown by chemical vapor deposition directly on silicon nitride [O] . Sun, Jie, Lindvall, Niclas, Cole, M. T., 2011

机译：通过化学气相沉积直接在氮化硅上生长的大面积均匀石墨烯状薄膜

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