Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography

Chua JK; Murukeshan VM

首页> 外文期刊>Physica Scripta: An International Journal for Experimental and Theoretical Physics >Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography

【24h】

Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography

机译：使用基于光栅的多束干涉光刻对二维纳米尺度特征进行构图

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

A grating-based multiple beams interference lithography for printing of periodic two-dimensional features is proposed in this paper both theoretically and experimentally. The analytical expressions of the interference intensity distributions are derived with the photoresist layer modeled as a sandwiched layer. The influence of polarization of incident beams on the profiles of resist features are also investigated and discussed via both experimental and theoretical approaches. Good agreement between theoretical and experimental results is observed.

机译：本文从理论和实验上提出了一种基于光栅的多光束干涉光刻技术，用于周期性二维特征的打印。通过将光致抗蚀剂层建模为夹心层，可以得出干涉强度分布的解析表达式。还通过实验和理论方法研究和讨论了入射光束的偏振对抗蚀剂特征轮廓的影响。观察到理论和实验结果之间的良好一致性。

著录项

来源
《Physica Scripta: An International Journal for Experimental and Theoretical Physics》 |2009年第1期|共5页
作者
Chua JK; Murukeshan VM;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类物理学;
关键词
INTERFEROMETRIC LITHOGRAPHY; POLARIZATION;

机译：干涉光刻技术;极化;

相似文献

外文文献
中文文献
专利

1. Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography [J] . Chua JK, Murukeshan VM Physica Scripta: An International Journal for Experimental and Theoretical Physics . 2009,第1期

机译：使用基于光栅的多束干涉光刻对二维纳米尺度特征进行构图
2. Four beams surface plasmon interference nanoscale lithography for patterning of two-dimensional periodic features [J] . Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures . 2010,第1期

机译：用于二维周期性特征图案化的四束表面等离激元干涉纳米光刻
3. Four beams surface pIasmon interference nanoscale lithography for patterning of two-dimensional periodic features [J] . K. V. Sreekanth, V. M. Murukeshan Journal of Vacuum Science & Technology . 2010,第1期

机译：用于二维周期性特征图案化的四束表面等离子干涉纳米级光刻
4. Measurement of nanoscale surface patterns produced by two-beam laser interference lithography [C] . Pan Haiyan, Liu Lanjiao, Xu Jia, Proceedings of the 2010 International Conference on Mechatronics and Automation . 2010

机译：测量两束激光干涉光刻产生的纳米级表面图案
5. Hierarchical multiple bit clusters and patterned media enabled by novel nanofabrication techniques -- High resolution electron beam lithography and block polymer self assembly. [D] . Xiao, Qijun. 2010

机译：通过新型纳米加工技术实现的分层多位簇和图案化介质-高分辨率电子束光刻和嵌段聚合物自组装。
6. Direct Write Protein Patterns for Multiplexed Cytokine Detection From Live Cells Using Electron Beam Lithography [O] . Uland Y. Lau, Sina S. Saxer, Juneyoung Lee, -1

机译：使用电子束光刻技术从活细胞中检测细胞因子的直接写入蛋白模式
7. MULTIPLE-BEAM INTERFERENCE LITHOGRAPHY WITH ELECTRON BEAM WRITTEN GRATINGS [O] . H. H. Solak, B. Steinacher, C. David, 2008

机译：电子束手写光栅的多光束干涉光刻

Patterning of two-dimensional nanoscale features using grating-based multiple beams interference lithography

摘要

著录项

相似文献

相关主题

期刊订阅